Abstract: Materials are described suitable for optical lithography in the ultraviolet region (including 157 nm and extreme ultraviolet region), and for electron beam lithography. These materials are based on new homopolymers and copolymers, they are characterized by the presence of polyhedral oligomeric silsequioxanes in their molecule, and they are suitable for single as well as bilayer lithography. Ethyl, or similar or smaller size, groups are used as alkyl substituents of the silsequioxanes in order to reduce problems related to pattern transfer, roughness, and high absorbance at 157 nm (such problems occur when the substituents are large alkyl groups such as cyclopentyl groups).

Abstract: Process for attracting male olive pests, particularly male Prays oleae or Palpita unionalis, wherein an appropriate amount of the following composition is used, preferably in an amount of about 10 to about 40 mg:an inclusion complex of a cyclodextrin and of at least one of the following compounds:a linear chain of 10 to 20 carbon atoms, substituted or not, saturated or unsaturated, under the acetate or aldehyde or alcohol form, provided that such chain is different from ethyl dodecanoate,and more particularly:Z-7-tetradecenal,E-11-hexadecenal,E-11-hexadecenyl acetate.The distribution of this sex pheromone confuses the male olive pests as to the whereabouts of the females.