Patents Assigned to NEC CORPORATION, TOKYO OHKA KOGYO CO., LTD.
  • Composition of photoresist remover effective against etching residue without damage to corrodible metal layer and process using the same
    Publication number: 20020146647
    Abstract: A photo-resist mask is ashed after the pattern transfer, and is, thereafter, treated with liquid photo-resist remover, wherein photo-resist remover comprises salt produced through interaction between hydrofluoric acid and a base without metal ion, water, water soluble organic solvent and a derivative of benztriazole expressed by the general formula: 1
    Type: Application
    Filed: March 11, 2002
    Publication date: October 10, 2002
    Applicant: NEC CORPORATION, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hidemitsu Aoki, Kenichi Nakabeppu, Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi