Abstract: Methods and reactors are disclosed for producing synthetic material on a substrate by microwave plasma activated chemical vapor deposition. The method comprises the step of providing a microwave plasma reactor configured to provide a plasma having a toroidal shape. The reactor comprises a resonant cavity and a substrate holder arranged to hold, preferably, an annular shaped substrate or a plurality of substrates arranged in an annular configuration.
Type:
Application
Filed:
July 18, 2017
Publication date:
August 29, 2019
Applicant:
NEOCOAT SA
Inventors:
David Rats, Medhi Naamoun, Christophe Provent
Abstract: The present invention relates to a method for depositing nanocrystalline diamond using a diamond vapor deposition facility which includes: a vacuum reactor including a reaction chamber connected to a vacuum source; a plurality of plasma sources arranged along a matrix that is at least two-dimensional in the reaction chamber; and a substrate holder arranged in the reactor, said method being characterized in that the deposition is carried out at a temperature of 100 to 500° C.
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