Patents Assigned to Netherlands B.V.
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Patent number: 9570114Abstract: A hermetically-sealed hard disk drive (HDD) utilizes a laminated film enclosure to hermetically seal an HDD within. The laminated film enclosure may be constructed of a heat sealant layer hermetically-sealed around the HDD, a barrier layer which inhibits gas from escaping from inside the laminated film enclosure, and a film surface protective layer which protects the heat sealant and barrier layers. Embodiments may include a heat sealant layer comprising a thermoplastic polymer such as polypropylene, a barrier layer comprising a metal such as aluminum, and a film surface protective layer comprising a thermoplastic polymer such as polyethylene terephthalate.Type: GrantFiled: January 15, 2016Date of Patent: February 14, 2017Assignee: HGST Netherlands B.V.Inventors: Kimihiko Sudo, Kazuki Takeichi, Takako Hayakawa, Yuta Onobu
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Patent number: 9570096Abstract: A method and apparatus is provided for extending a read bandwidth and increasing a high-frequency signal-to-noise ratio (SNR) of a front-end of a read path of a hard disk drive (HDD) by introducing a high impedance section at the front-end of the read path. The high impedance section may mitigate capacitive effects found at the front-end of the read path, thereby improving signal transfer by extending the read bandwidth.Type: GrantFiled: August 6, 2010Date of Patent: February 14, 2017Assignee: HGST NETHERLANDS B.V.Inventors: John Contreras, Tatemi Ido, Nobumasa Nishiyama, Xinzhi Xing
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Patent number: 9570246Abstract: Disconnector for switchgear, having a first contact position, in which a contact is between main and first terminals, and a second contact position, in which a contact is between the main and second terminal. The disconnector includes a connector body moveable in a first direction between the first and second positions and having an end extendable in a direction substantially perpendicular to the first direction for providing a contact force between the end and the first, second or main terminals, a first operating mechanism arranged to move the body between the first and second positions, and a second operating mechanism arranged to extend the end when the disconnector is in either the first or second contact positions, in which the end includes a conical inside surface and the second operating mechanism includes a first shaft having a first conically shaped end positioned inside the conical inside surface.Type: GrantFiled: July 29, 2014Date of Patent: February 14, 2017Assignee: EATON INDUSTRIES (NETHERLANDS) B.V.Inventors: Gerhardus Leonardus Nitert, Arend Jan Willem Lammers
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Patent number: 9570323Abstract: For so called film assisted moulding (FAM) device processing techniques there is provided lead frame for a semiconductor device, comprising a base portion and a connection lead, said base portion arranged for mounting a semiconductor die, said connection lead comprising a horizontal portion for external connection and an angled portion for connection to said semiconductor die, wherein the angled portion has a positive angle with respect to the base portion. The connection lead may comprise a recessed portion.Type: GrantFiled: September 4, 2014Date of Patent: February 14, 2017Assignee: Ampleon Netherlands B.V.Inventors: Freek Egbert van Straten, Jeremy Joy Montalbo Incomio, Albertus Reijs
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Patent number: 9568841Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: March 24, 2016Date of Patent: February 14, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20170038695Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.Type: ApplicationFiled: October 20, 2016Publication date: February 9, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Marcel BECKERS, Stefan Philip Christiaan BELFROID, Ferdy MIGCHELBRINK, Sergei SHULEPOV
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Publication number: 20170038692Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.Type: ApplicationFiled: February 13, 2015Publication date: February 9, 2017Applicant: ASML Netherlands B.V.Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Xiaofeng LIU
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Publication number: 20170036272Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.Type: ApplicationFiled: October 18, 2016Publication date: February 9, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
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Publication number: 20170038693Abstract: A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.Type: ApplicationFiled: March 19, 2015Publication date: February 9, 2017Applicant: ASML Netherlands B.V.Inventors: Robertus Johannes Marinus DE JONGH, Leon Leonardus Franciscus MERKX, Roel Johannes Elisabeth MERRY
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Patent number: 9563137Abstract: A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.Type: GrantFiled: May 20, 2010Date of Patent: February 7, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Arnoldus Lammers, Luigi Scaccabarozzi
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Patent number: 9563367Abstract: The present disclosure relates to methods, apparatuses, systems, and computer program products for processing commands for accessing solid state drives. Example methods can include receiving, from a host, a loaded command availability message. The loaded command availability message can indicate that a command associated with the loaded command availability message uses a low latency mode. The methods can further include executing the associated command.Type: GrantFiled: August 26, 2014Date of Patent: February 7, 2017Assignee: HGST Netherlands B.V.Inventors: Frank Chu, Zvonimir Z. Bandic, Dejan Vucinic, Cyril Guyot, Qingbo Wang
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Patent number: 9564585Abstract: Embodiments of the present disclosure generally relate to electronic devices, and more specifically, to multi-level phase change devices. In one embodiment, a memory cell device is provided. The memory cell device generally includes a top surface, a bottom surface and a cell body between the top surface and the bottom surface. The cell body may include a plurality of phase change material layers, which may be used to store data of the cell. In another embodiment, a method of programming a memory cell is provided. The method generally may include applying a sequence of different pulses to each phase change material layer of the cell as the voltage of each pulse in the sequence is ratcheted down from the start of a write cycle to the end of a write cycle.Type: GrantFiled: September 3, 2015Date of Patent: February 7, 2017Assignee: HGST NETHERLANDS B.V.Inventors: Jeffrey Lille, Luiz M. Franca-Neto
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Patent number: 9563131Abstract: A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.Type: GrantFiled: November 6, 2015Date of Patent: February 7, 2017Assignee: ASML Netherlands B.V.Inventor: Richard Quintanilha
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Patent number: 9563135Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.Type: GrantFiled: September 21, 2011Date of Patent: February 7, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Steven George Hansen, Heine Melle Mulder, Tsann-Bim Chiou
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Patent number: 9563132Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.Type: GrantFiled: August 1, 2012Date of Patent: February 7, 2017Assignee: ASML NETHERLANDS B.V.Inventors: David Bessems, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Adrianes Johannes Baeten, Cornelius Maria Rops
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Patent number: 9564581Abstract: Embodiments of the present disclosure generally relate to memory devices having enhanced perpendicular magnetic anisotropy. The memory device includes a plurality of first leads, a plurality of second leads, and a plurality of memory cells having a plurality of magnetic layers and a tunneling barrier layer. An interfacial layer is incorporated in each memory cell between one of the magnetic layers and the tunneling barrier layer to enhance perpendicular magnetic anisotropy, while preserving high tunneling magnetoresistance.Type: GrantFiled: November 20, 2015Date of Patent: February 7, 2017Assignee: HGST Netherlands B.V.Inventors: Young-Suk Choi, Kurt Allan Rubin, Derek Stewart
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Publication number: 20170031246Abstract: An inspection apparatus is provided for measuring properties of a non-periodic product structure (500?). A radiation source (402) and an image detector (408) provide a spot (S) of radiation on the product structure. The radiation is spatially coherent and has a wavelength less than 50 nm, for example in the range 12-16 nm or 1-2 nm. The image detector is arranged to capture at least one diffraction pattern (606) formed by said radiation after scattering by the product structure. A processor receives the captured pattern and also reference data (612) describing assumed structural features of the product structure. The process uses coherent diffraction imaging (614) to calculate a 3-D image of the structure using the captured diffraction pattern(s) and the reference data. The coherent diffraction imaging may be for example ankylography or ptychography. The calculated image deviates from the nominal structure, and reveals properties such as CD, overlay.Type: ApplicationFiled: July 22, 2016Publication date: February 2, 2017Applicant: ASML Netherlands B.V.Inventor: Arie Jeffrey DEN BOEF
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Publication number: 20170031250Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: October 13, 2016Publication date: February 2, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
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Publication number: 20170031249Abstract: The invention relates to a lithographic apparatus comprising: a first object, a second object which is moveable relative to the first object in a moving direction, a set of cables and/or tubing arranged between the first object and the second object, a guiding drum to guide the set of cables and/or tubing, said guiding drum being rotatable about a rotation axis extending perpendicular to the moving direction, a drum positioning device to position the guiding drum such that it follows movement of the set of cables and/or tubing caused by movement of the second object relative to the first object and a guiding structure to guide movement of the guiding drum in the moving direction.Type: ApplicationFiled: April 15, 2015Publication date: February 2, 2017Applicant: ASML NETHERLANDS B.V.Inventor: Sander Christiaan BROERS
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Patent number: 9558814Abstract: A memory cell including a floating gate transistor including a floating gate, and an analog sensor element adjacent to the floating gate, where an electrical characteristic of the analog sensor element is affected by an amount of charge on the floating gate.Type: GrantFiled: April 10, 2015Date of Patent: January 31, 2017Assignee: HGST Netherlands, B.V.Inventors: Roger F. Galinggana, Jr., James Arnold V. Gregana, Lloyd Henry I. Li