Patents Assigned to New Wave Research, Inc.
  • Publication number: 20070046934
    Abstract: A system is described that combines an optical spectrometer and a particle analysis spectrometer for simultaneous and/or sequential analysis of a sample placed in a sample chamber. A laser resonator generates a light beam on the sample in the sample chamber to produce a plasma formation and an aerosol formation. The optical spectrometer (spectrophotometer) analyzes a plasma formation generated from the sample surface of the sample, qualifies and/or quantifies and records chemical data of the sample. The particle analysis spectrometer analyzes an aerosol formation generated from the sample in the sample chamber, and qualifies and/or quantifies and records data of the sample. The combination of the optical spectrometer and the particle analysis spectrometer in the system enables simultaneous and/or sequential analysis, qualification and/or quantification, and recording of the chemical and physical data derived from the transfer of laser energy into a solid, liquid or gas.
    Type: Application
    Filed: August 26, 2005
    Publication date: March 1, 2007
    Applicant: New Wave Research, Inc.
    Inventor: John Roy
  • Patent number: 7169688
    Abstract: A method and system for cutting a wafer comprising a semiconductor substrate attached to an array of integrated devices includes placing the wafer on a stage such as a movable X-Y stage including a vacuum chuck having a porous mounting surface, and securing the wafer during and after cutting by vacuum pressure through the pores. The wafer is cut by directing UV pulses of laser energy at the substrate using a solid-state laser having controlled polarization. An adhesive membrane can be attached to the separated die to remove them from the mounting surface, or the die can otherwise be removed after cutting from the wafer.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: January 30, 2007
    Assignee: New Wave Research, Inc.
    Inventor: Kuo-Ching Liu
  • Publication number: 20060027886
    Abstract: A method and system for cutting a wafer comprising a conductive substrate attached to an array of integrated devices includes placing the wafer on a stage such as a movable X-Y stage including a vacuum chuck having a porous mounting surface, and securing the wafer during and after cutting by vacuum pressure through the pores. The wafer is cut by directing UV pulses of laser energy at the conductive substrate using a solid-state laser. An adhesive membrane can be attached to the separated die to remove them from the mounting surface, or the die can otherwise be removed after cutting from the wafer.
    Type: Application
    Filed: October 5, 2005
    Publication date: February 9, 2006
    Applicant: New Wave Research, Inc
    Inventor: Kuo-Ching Liu