Abstract: The present disclosure relates to a hybrid deposition apparatus for gallium oxide, and a hybrid deposition apparatus for gallium oxide according to a disclosed embodiment of the present disclosure includes a gas supply assembly for supplying a source gas, a reaction gas, and a purge gas, a liquid supply assembly for supplying at least a portion of the source gas, and a chamber unit which is connected to the gas supply assembly and the liquid supply assembly and has a substrate disposed therein.

Abstract: An atomic layer depositing apparatus includes: a gas supply assembly configured to supply a source gas, a reaction gas, and a purge gas; and a substrate transfer module disposed on a lower side of the gas supply assembly, configured to move linearly, and having an upper side on which the substrate is seated. The gas supply assembly includes: a purge gas supply module connected to a purge gas supply line in which the purge gas flows, a reaction gas supply module connected to a reaction gas supply line in which the reaction gas flows, a source gas supply module configured to selectively communicate with any one of the purge gas supply line and a source gas supply line in which the source gas flows, a pumping module disposed among the purge gas supply module, the reaction gas supply module, and the source gas supply module.

Abstract: The present disclosure relates to an atomic layer deposition apparatus, and more particularly, to an atomic layer deposition apparatus for depositing an atomic layer on a flexible substrate.