Patents Assigned to NGK Filtech, Ltd.
  • Patent number: 7922915
    Abstract: A wastewater treatment system including carbon dioxide gas injection means for injecting a carbon dioxide gas into wastewater which takes place during silicon processing to obtain raw wastewater to be treated; a wastewater tank; a filter membrane through which the raw wastewater is filtered; a liquid forwarding pump which forwards the raw wastewater to the filter membrane; and circulation/forwarding control means which can forward concentrated water and/or filtered water to the wastewater tank and which can regulate the pH of the raw wastewater to 4.0 to 6.5 to forward this wastewater to the filter membrane, when the amount of the raw wastewater present in the wastewater tank is below a reference amount.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: April 12, 2011
    Assignees: NGK Insulators, Ltd., NGK Filtech, Ltd.
    Inventor: Shinichi Kosaka
  • Publication number: 20090236292
    Abstract: A wastewater treatment system 20 including carbon dioxide gas injection means 3 for injecting a carbon dioxide gas into wastewater which takes place during silicon processing to obtain raw wastewater to be treated; a wastewater tank 2; a filter membrane 11 through which the raw wastewater is filtered; a liquid forwarding pump 9 which forwards the raw wastewater to the filter membrane 11; and circulation/forwarding control means 30 which can forward concentrated water and/or filtered water to the wastewater tank 2 and which can regulate the pH of the raw wastewater to 4.0 to 6.5 to forward this wastewater to the filter membrane 11, when the amount of the raw wastewater present in the wastewater tank 2 is below a reference amount.
    Type: Application
    Filed: June 3, 2009
    Publication date: September 24, 2009
    Applicants: NGK Insulators, Ltd., NGK Filtech, Ltd.
    Inventor: Shinichi Kosaka