Abstract: A silica membrane filter 10 includes a porous substrate 13 and a silica membrane 18 formed on the porous substrate 13, the silica membrane 18 having an aryl group. The silica membrane 18 has an atomic ratio Si/C, as determined, by elemental analysis using energy-dispersive X-ray spectrometry (EDX), in the range of 0.2 to 15. The silica membrane 18 preferably has a thickness in the range of 30 nm to 300 nm and an X/Y, a ratio of an absorption intensity X of a Si—O—Si bond to an absorption intensity Y based on the aryl group in a Fourier transform infrared absorption spectrum (FT-IR), in the range of 5.0 to 200.
Abstract: An electrode clamp device for use in electrochemical machines for simultaneously holding a plurality of electrodes made of metallic pipes. The clamp device comprises a clamp block having a plurality of electrode inserting through holes and a plurality of blind tapped holes each of which is perpendicular to the corresponding through hole and has a depth such that the bottom surface of the tapped hole is located in a plane containing the central axis of the through hole to provide an electrode receiving groove in the bottom surface of the tapped hole. Each of the electrodes is individually clamped against the electrode receiving groove with an elastic member by means of a set-screw screwed in the tapped hole.
Type:
Grant
Filed:
July 3, 1991
Date of Patent:
October 27, 1992
Assignees:
NGK Insulatos, Ltd., Institute of Technology Precision Electrical Discharge Works