Abstract: The disclosure describes optical elements including pseudorandom-shaped meta-atoms as well as related methods of manufacture. In some implementations, a method includes patterning a resist layer to form a pattern of features in the resist layer. The resist layer is disposed on a substrate that includes an optical sublayer disposed on a support. The substrate further includes a hard mask sublayer disposed on the optical sublayer. The method includes performing a first oxygen plasma etch to impart a pseudorandom shape to the features in the resist layer, and subsequently performing a plurality of etching operations to cause the pseudorandom-shaped features to be transferred into the optical sublayer of the substrate.

Abstract: A method includes providing a coating (208) over a first surface (202) of a substrate (204) and over a metasurface (200) on the first surface of the substrate; and imprinting the coating to cause a surface of the coating to have a predetermined characteristic. A device includes a substrate; a metasurface on a first surface of the substrate; and a coating on the metasurface and on the first surface of the substrate, a surface of the coating defining a functional structure.

Abstract: A method includes providing a coating over a surface of a substrate, a plurality of seed structures being disposed on the surface of the substrate, in which respective heights of the seed structures define local thicknesses of the coating. An optical device includes a substrate, a plurality of seed structures on a surface of the substrate, and a coating on the seed structures and on the surface of the substrate, in which respective heights of the seed structures define local thicknesses of the coating.

Abstract: The present disclosure describes diffractive optical elements (DOEs) and master tools for producing the DOEs. In one aspect, the disclosure describes a method that includes modifying a first pixel layout design for diffractive optical elements to obtain a modified pixel layout design. The first pixel layout design comprises pixels, each of which has a shape of a regular polygon (e.g., a rectangular shape). Modifying the first pixel layout design includes approximating a shape contour of a cluster of pixels in the first pixel layout design by a single polygon that reduces a total number of edges relative to the shape contour of the cluster of pixels in the first pixel layout design. The method also includes using the modified pixel layout design to form a master tool for production of the diffractive optical elements.

Abstract: The present disclosure describes techniques for fabricating a multi-level structure. For example, in accordance with some implementations, the disclosure describes techniques for fabricating a multi-level master from which optical elements can be replicated either directly or by way of a sub-master. The disclosure also describes multi-level optical elements and processes for making them.

Abstract: Methods of manufacturing an optical device can include, in some implementations, providing a substrate having a first polymeric layer on a surface of the substrate and a second polymeric layer on the first polymeric layer, forming first openings in the second polymeric layer to define an etch mask composed of material of the second polymeric layer, and etching to form second openings in the first polymeric layer, wherein locations of the second openings are defined by the etch mask. A material is deposited in the second openings to form meta-atoms of a first metastructure, wherein adjacent ones of the meta-atoms are separated from one another by polymeric material of the first polymeric layer. Optical devices including metastructures can be formed, where meta-atoms of the metastructure have a relatively high aspect ratio.

Abstract: A method for manufacturing thermoelectric generators or other devices includes imprinting a first replication layer to form a first metastructure, and imprinting a second replication layer to form a second metastructure. The first replication layer is composed of nanoparticles embedded in a polymer, and is disposed on a surface of a first substrate that includes first electrical contacts. The second replication layer also is composed of nanoparticles embedded in a polymer, and is disposed on a surface of a second substrate that includes second electrical contacts. The method includes bonding meta-atoms of the second metastructure to the first electrical contacts, and bonding meta-atoms of the first metastructure to the second electrical contacts, such that respective ones of the meta-atoms of the first metastructure are connected electrically in series with respective ones of the meta-atoms of the second metastructure.

Abstract: Design techniques are described for diffractive optical elements that, at least in some instances, can permit the design of diffractive optical elements without high frequency features, or with a significantly reduced number of such features. Diffractive optical elements designed in accordance with the described techniques can, in some instances, be easier to manufacture and/or replicate.

Abstract: Techniques for designing diffractive optical elements (DOEs) such as diffusers and other optical beam shaping elements can include designing a DOE unit cell on a smaller area than the overall area of the DOE, and then distributing the unit cell across the entire surface for the DOE. Height translations are introduced for at least some of the unit cells distributed across the surface, where the height translations correspond to respective phase translations for the intended operational wavelength of the DOE. In some instances, phase wrapping is introduced to translate the height variations among the unit cells into unit cells having sub-unit structures whose heights fall within a range that corresponds to a specified phase range at the operational wavelength.

Abstract: An optical device includes an array of light-emitting elements, including a first subset of light-emitting elements and a second subset of light-emitting elements. The first subset of light-emitting elements is configured to emit light having wavelength L1. The device includes a high refractive index material selectively disposed on the second subset of light-emitting elements and an array of optical elements positioned so as to be illuminated by the first subset of light-emitting elements and by the second subset of light-emitting elements. The optical elements are regularly arranged in a common plane at a pitch P, the common plane is located a distance D from the array of light-emitting elements, and P2?2L1D/N, N being an integer greater than or equal to 1.

Abstract: The present invention relates to methods for embedded a micrometer and/or nanometer pattern into an injection molding tool. In a first main aspect, a micro/nanometer structured imprinting device is applied in, or on, an active surface so as to transfer the micro/nanometer patterned structure to the tool while the imprinting device is, at least partly, within a cavity of the injection molding tool. In a second main aspect, a base plate with a micro/nanometer structured pattern positioned on an upper part is positioned on the active surface within the tool, the lower part of the base plate facing the tool, the active surface receiving the base plate being non-planar on a macroscopic scale. Both aspects enable a simple and effective way of transferring the pattern, and the pattern may be transferred on the active working site of tool immediately prior to molding without the need for extensive preparations or remounting of the tool before performing the molding process.

Abstract: The present invention relates to a method for performing high speed electron beam lithography (EBL). An electron beam source (EBS), capable of emitting an electron beam towards the energy sensitive resist, forms a first pattern (P1) on the substrate, the first pattern defining a first direction (D1) on the substrate. The electron beam source then forms a second pattern (P2) on the substrate. The energy and/or dose delivered to the energy sensitive resist during the exposure of the first and the second pattern is dimensioned so that the threshold dose/energy of the energy sensitive resist is reached on the overlapping portions of the first and the second patterns (P1, P2). The invention provides a high speed technique for the production of substrates with high quality developed patterns, e.g. hole or dot arrays, by electron beam lithography. Each hole or dot may be defined by the mutually overlapping portions of the first and second pattern, e.g.

Abstract: The present invention relates to methods for embedded a micrometer and/or nanometer pattern into an injection molding tool. In a first main aspect, a micro/nanometer structured imprinting device is applied in, or on, an active surface so as to transfer the micro/nanometer patterned structure to the tool while the imprinting device is, at least partly, within a cavity of the injection molding tool. In a second main aspect, a base plate with a micro/nanometer structured pattern positioned on an upper part is positioned on the active surface within the tool, the lower part of the base plate facing the tool, the active surface receiving the base plate being non-planar on a macroscopic scale. Both aspects enable a simple and effective way of transferring the pattern, and the pattern may be transferred on the active working site of tool immediately prior to molding without the need for extensive preparations or remounting of the tool before performing the molding process.

Abstract: The present invention relates to a nano-imprinting stamp for imprinting nanometer-sized to mm-sized structures, the stamp (1) having a base part and a first and a second imprinting section (2,3), the first and second imprinting sections having a lithographic pattern (7) intended for imprinting in a receiving substrate. In a first aspect, the first and the second imprinting sections (2,3) are independently displaceable in a direction substantially parallel to an imprinting direction of the imprinting stamp. In a second aspect, the first and the second imprinting sections (2,3) are mechanically weakly coupled in a direction substantially parallel to an imprinting direction of the imprinting stamp. The stamp limits the effect of imperfections in or on the substrate to be imprinted with a lithographic pattern (7) and imperfections in or on the stamp and any combinations of such imperfections by localising the bending of the stamp to the base part (5) in-between the imprinting sections (2,3).