Patents Assigned to Nion Co.
  • Patent number: 8373137
    Abstract: A high resolution energy-selecting electron beam apparatus and method for improving the energy resolution of electron-optical systems by restricting the energy range of admitted electrons, and optionally also for improving the spatial resolution by correcting chromatic and geometric aberrations. The apparatus comprises a plurality of magnetic or electrostatic prisms that disperse an electron beam according to the energies of the electrons into an energy spectrum, a plurality of magnifying lenses such as electromagnetic or electrostatic quadrupoles that increase the energy dispersion of the energy spectrum, an energy-selecting slit that selects a desirable range of energies of the electrons, and optionally also sextupole, octupole and higher-order lenses that correct chromatic and geometric aberration of the electron-optical system.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: February 12, 2013
    Assignee: Nion Co.
    Inventors: Ondrej L. Krivanek, Niklas Dellby
  • Publication number: 20120074315
    Abstract: A high resolution energy-selecting electron beam apparatus and method for improving the energy resolution of electron-optical systems by restricting the energy range of admitted electrons, and optionally also for improving the spatial resolution by correcting chromatic and geometric aberrations. The apparatus comprises a plurality of magnetic or electrostatic prisms that disperse an electron beam according to the energies of the electrons into an energy spectrum, a plurality of magnifying lenses such as electromagnetic or electrostatic quadrupoles that increase the energy dispersion of the energy spectrum, an energy-selecting slit that selects a desirable range of energies of the electrons, and optionally also sextupole, octupole and higher-order lenses that correct chromatic and geometric aberration of the electron-optical system.
    Type: Application
    Filed: September 24, 2010
    Publication date: March 29, 2012
    Applicant: Nion Co.
    Inventors: Ondrej L. Krivanek, Niklas Dellby
  • Patent number: 6552340
    Abstract: An autoadjusting charged-particle probe-forming apparatus improving the resolution of probe-forming charged-particle optical systems by minimizing optical aberrations. The apparatus comprises a source of charged particles, a probe-forming system of charged-particle lenses, a plurality of detectors optionally comprising a two-dimensional image detector, power supplies, a computer and appropriate software. Images are recorded by the two-dimensional detector and analyzed to determine the aberration characteristics of the apparatus. Alternately, multiple scanned images are recorded by a scanned image detector and also analyzed to determine the aberration characteristics of the apparatus. The aberration characteristics are used to automatically adjust the apparatus for improved optical performance.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: April 22, 2003
    Assignee: Nion Co.
    Inventors: Ondrej L. Krivanek, Niklas Dellby, Andrew R. Lupini