Abstract: A simulation apparatus includes: a factor amount converting information storage unit in which factor amount converting information, which is information indicating correspondence between low-fidelity information and high-fidelity information, is stored; a writing pattern information storage unit in which writing pattern information is stored; an ADI simulation unit that performs an ADI simulation using one or more evaluation points, for a writing pattern indicated by the writing pattern information, thereby acquiring one or more factor amounts; a converting unit that acquires high-fidelity information, which is one or more factor amounts, corresponding to the low-fidelity information, which is one or more factor amounts, using the factor amount converting information; and an etching simulation unit that performs an etching simulation using the one or more factor amounts acquired by the converting unit.

Abstract: A clustering apparatus includes: an accepting unit that accepts pieces of target data, each of which is a vector; a slime mold information constructing unit that constructs, using the pieces of target data, slime mold information, which is information having one piece of hub cell information corresponding to a central cell of a slime mold and one or more pieces of branch cell information corresponding to a cell that is divided from the central cell for predation; and a clustering unit that associates each of the pieces of target data with branch cell information having the shortest distance from a vector contained in the branch cell information to the target data, among the one or more pieces of branch cell information contained in the constructed slime mold information, thereby clustering the target data into clusters in the same number as that of the pieces of branch cell information.

Abstract: A pattern correction amount calculating apparatus includes: an accepting unit that accepts pattern information; a micro side group acquiring unit that acquires a micro side group, which is a group of continuous sides forming a contour of a pattern figure indicated by the pattern information, and is a group of micro sides that are each small enough to satisfy a predetermined condition; a virtual side acquiring unit that acquires a virtual side, which is a side that approximates micro sides contained in the micro side group; a virtual side correction amount calculating unit that calculates a virtual side correction amount, which is a correction amount for the virtual side; and a micro side correction amount calculating unit that calculates micro side correction amounts, which are correction amounts respectively for the micro sides contained in the micro side group corresponding to the virtual side, using the virtual side correction amount.

Abstract: In order to solve the problem that information indicating three or more points on a contour of a figure drawn by an electron beam writer cannot be more precisely acquired, an information processing apparatus includes: an accepting unit that accepts pattern information indicating a pattern figure, and actually observed contour information acquired using an image obtained by capturing an image of a figure drawn by an electron beam writer; a transforming information acquiring unit that acquires transforming information, which is information that minimizes the sum of squares of differences between convolution values corresponding to three or more corrected contour points of a given point spread function in a region indicated by the pattern figure indicated by the pattern information and a threshold regarding the convolution values; a corrected contour point acquiring unit that acquires corrected contour point information, which is information indicating three or more corrected contour points respectively correspo

Abstract: In order to solve the problem that information indicating three or more points on a contour of a figure drawn by an electron beam writer cannot be more precisely acquired, an information processing apparatus includes: an accepting unit that accepts pattern information indicating a pattern figure, and actually observed contour information acquired using an image obtained by capturing an image of a figure drawn by an electron beam writer; a transforming information acquiring unit that acquires transforming information, which is information that minimizes the sum of squares of differences between convolution values corresponding to three or more corrected contour points of a given point spread function in a region indicated by the pattern figure indicated by the pattern information and a threshold regarding the convolution values; a corrected contour point acquiring unit that acquires corrected contour point information, which is information indicating three or more corrected contour points respectively correspo

Abstract: A clustering apparatus includes: an accepting unit that accepts pieces of target data, each of which is a vector; a slime mold information constructing unit that constructs, using the pieces of target data, slime mold information, which is information having one piece of hub cell information corresponding to a central cell of a slime mold and one or more pieces of branch cell information corresponding to a cell that is divided from the central cell for predation; and a clustering unit that associates each of the pieces of target data with branch cell information having the shortest distance from a vector contained in the branch cell information to the target data, among the one or more pieces of branch cell information contained in the constructed slime mold information, thereby clustering the target data into clusters in the same number as that of the pieces of branch cell information.

Abstract: An electron beam drawing apparatus includes: an accepting unit that accepts input graphic information, which is information representing at least one graphic; a graphic width acquiring unit that acquires a width of each of the at least one graphic represented by the input graphic information; a generating unit that generates approximate graphic information representing at least one approximate graphic, which is a graphic configured by at least one rectangle matching the width of the graphic, and is a graphic that approximates each of the at least one graphic represented by the input graphic information; and a drawing unit that draws the at least one approximate graphic represented by the approximate graphic information generated by the generating unit.

Abstract: Stored energy is evaluated for each of segmented regions, and using the evaluated stored energy, an optimal irradiation amount for an electron beam is evaluated by a conjugate gradient method. The evaluated stored energy is used instead of calculating a determinant (Apk) in the procedure that includes calculation of the determinant (Apk) from among repeated calculation procedures that follow the conjugate gradient method and seek to answer a simultaneous linear equation (Ax=b) with a matrix (A) as a coefficient. Thus it is possible to evaluate the optimal irradiation amount for an electron beam with a high processing speed and a high degree of accuracy, and without expressly requiring the calculation of Apk, by managing the giant matrix (A) comprising numerous factors according to reduction of lines of circuitry in a circuit pattern.

Abstract: Stored energy is evaluated for each of segmented regions, and using the evaluated stored energy, an optimal irradiation amount for an electron beam is evaluated by a conjugate gradient method. The evaluated stored energy is used instead of calculating a determinant (Apk) in the procedure that includes calculation of the determinant (Apk) from among repeated calculation procedures that follow the conjugate gradient method and seek to answer a simultaneous linear equation (Ax=b) with a matrix (A) as a coefficient. Thus it is possible to evaluate the optimal irradiation amount for an electron beam with a high processing speed and a high degree of accuracy, and without expressly requiring the calculation of Apk, by managing the giant matrix (A) comprising numerous factors according to reduction of lines of circuitry in a circuit pattern.

Abstract: A sheet screen is provided on one of sides of test glass, and a projected image of the test glass is electronically and directly picked up. After tone image signals of the test glass thus picked up are binarized while modifying threshold values according to brightness of a background in the tone image, the number of fragments, the area of the greatest fragment and the length of the longest fragment are calculated. Thus, operations, such as calculating the number of the fragments, can be automatically performed by directly picking up an image of the test glass, allowing a fragmentation test to be carried out with good operability and high precision.