Abstract: Provided by the present invention is a lubricating oil composition showing a very low frictional coefficient when used as a lubricating oil for a low friction sliding material prepared by blending with an additive selected from a specific phosphorus-zinc-containing compound and a specific sulfur-containing compound, and a sliding mechanism having an excellent low frictional property in which a DLC film containing 5 to 50 atom % of hydrogen is formed or a sliding mechanism having an excellent low frictional property in which 1 to 30 atom % of tungsten (W) or molybdenum (Mo) is contained is provided by combining the above lubricating oil composition with a sliding member having a film of a specific low frictional sliding material on a sliding face.

Abstract: Provided by the present invention is a lubricating oil composition showing, though containing ZnDTP as an abrasion resistant agent, a low friction coefficient when used as a lubricating oil for a low friction sliding material, that is, a specific lubricating oil composition which is prepared by blending a lubricant base oil with (A) a specific alkali earth metal-containing cleaning agent, (B) a specific boron-non-containing succinimide base ashless dispersant, (C) a zinc dialkyldithiophosphate and (D) a specific sulfur base compound and which is used for a low friction sliding material.

Abstract: An arc evaporation source constituting this vacuum arc deposition apparatus has a plurality of cathodes, a trigger electrode, a trigger drive unit, a shutter, and a shutter drive unit. The trigger drive unit changes over the position of the trigger electrode to thereby position the trigger electrode in front of a desired cathode, and connects/disconnects the trigger electrode to/from the desired cathode in the changed-over position. The shutter covers the fronts of all the cathodes except the desired cathode. The shutter drive unit moves the shutter to thereby change over the cathode not covered with the shutter. Further, the vacuum arc deposition apparatus has a changeover control unit for controlling the shutter drive unit and the trigger drive unit to thereby change over the cathode not covered with the shutter and to thereby position the trigger electrode in front of the cathode not covered with the shutter.

Abstract: An arc evaporation source constituting this vacuum arc deposition apparatus has a plurality of cathodes, a trigger electrode, a trigger drive unit, a shutter, and a shutter drive unit. The trigger drive unit changes over the position of the trigger electrode to thereby position the trigger electrode in front of a desired cathode, and connects/disconnects the trigger electrode to/from the desired cathode in the changed-over position. The shutter covers the fronts of all the cathodes except the desired cathode..: The shutter drive unit moves the shutter to thereby change over the cathode not covered with the shutter. Further, the vacuum arc deposition apparatus has a changeover control unit for controlling the shutter drive unit and the trigger drive unit to thereby change over the cathode not covered with the shutter and to thereby position the trigger electrode in front of the cathode not covered with the shutter.