Patents Assigned to Nippon Laser & Electronics Lab.
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Patent number: 6787364Abstract: A sample chip analyzing device includes a waveguide plate which entirely reflects and guides incident light and has a number of sampling probes that are connectable to a sample to be analyzed, a light source which irradiates fluorescent pumping light onto an end face of an end portion of the waveguide plate that is inserted into a light-shielding box, and a pickup member which picks up an image of substantially an entire surface of the waveguide plate. The sample to be analyzed is labeled with fluorescent substances that are fluorescence-pumped by an evanescent wave which occurs when the fluorescent pumping light enters into an interior of the waveguide to be entirely reflected and guided, and the sample is analyzed by detecting respective ones of the sampling probes that are coupled to the fluorescence-pumped flourescent substances of the labeled sample, based on data outputted by the pickup member.Type: GrantFiled: May 2, 2001Date of Patent: September 7, 2004Assignee: Nippon Laser & Electronics Lab.Inventors: Haruo Tajima, Hidekatsu Yoneda
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Patent number: 6486951Abstract: In an apparatus for evaluating an anisotropic thin film, an optical system generates a light beam having a predetermined diameter and polaraization state to project the light beam as incident light into a thin film sample corresponding to the anisotropic thin film. An analyzer is disposed at an optically down stream side of the thin film sample. At an optically down stream side of the analyzer, a two-dimensional photo-intensity detector is disposed to detect reflected light, obtained from the thin film sample, through the analyzer. The detector produces a light intensity distribution. On the basis of the light intensity distribution, an evaluating unit evaluates an inplane distribution of an optical anisotropy of the thin film sample.Type: GrantFiled: March 23, 2001Date of Patent: November 26, 2002Assignees: NEC Corporation, Nippon Laser & Electronics Lab.Inventors: Ichiro Hirosawa, Daisuke Tanooka
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Publication number: 20010024277Abstract: In an apparatus for evaluating an anisotropic thin film, an optical system generates a light beam having a predetermined diameter and polaraization state to project the light beam as incident light into a thin film sample corresponding to the anisotropic thin film. An analyzer is disposed at an optically down stream side of the thin film sample. At an optically down stream side of the analyzer, a two-dimensional photo-intensity detector is disposed to detect reflected light, obtained from the thin film sample, through the analyzer. The detector produces a light intensity distribution. On the basis of the light intensity distribution, an evaluating unit evaluates an inplane distribution of an optical anisotropy of the thin film sample.Type: ApplicationFiled: March 23, 2001Publication date: September 27, 2001Applicant: NEC Corporation and Nippon Laser & Electronics Lab.Inventors: Ichiro Hirosawa, Daisuke Tanooka
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Patent number: 5855682Abstract: A plasma thin-film forming apparatus comprises a vacuum vessel, a positive and a negative electrode disposed in the vacuum vessel so that the discharge surfaces may face each other at a required interval, an exhaust means for making a required vacuum condition in the interior of the vacuum vessel, a high-voltage impressing means for generating DC glow discharge by impressing high voltage between the positive and the negative electrode, and a gas-inducting means for supplying metal compound-including gas into the vacuum vessel. The gas-inducting means comprises a flexible holding member gastightly fitted to a sublimation chamber communicating with the vacuum vessel and having a hollow portion therein and a glass container inserted in the hollow portion of the holding member and enclosing a predetermined quantity of crysterized osmium tetraoxide therein. The exhaust means is provided with a material gas-adsorbing means in the exhaust port.Type: GrantFiled: January 27, 1997Date of Patent: January 5, 1999Assignee: Nippon Laser & Electronics LabInventor: Katsumi Yoneda
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Patent number: 5753355Abstract: A helical structure with a high toughness includes a number of helical elements as an artificial substitute for collagen filament constituting a biological tissue, which can be easily exchanged for a part so as to permanently extend the service life, and which can be easily assembled into a required structure and vice versa. The helical elements are made of wiry materials with a predetermined diameter helically wound with a predetermined lead and pitch so that the diameter of the helix of the helical elements is about two times that of the wiry material. The form of the crest of the structure may correspond with that of the trough, and the trough may be located outside the center of the helix. A number of the helical elements are collectively solidified with their mutual troughs and crests united side by side.Type: GrantFiled: April 15, 1996Date of Patent: May 19, 1998Assignee: Nippon Laser & Electronics Lab.Inventor: Nobuhiko Katsura