Patents Assigned to Nippon Light Metal Company, Ltd.
  • Patent number: 6105849
    Abstract: The root shape of a flash formed in the friction-welded joint is controlled by introducing an upset delay time interposed between termination of the friction step and commencement of the upset step and by controlling the upset displacement speed. This provides a friction-welded joint having a tensile strength and a fatigue strength which are comparable with those of TIG- or MIG- welded joints and enables aluminum alloy hollow members to be produced by friction welding instead of TIG or MIG welding. Typically, the upset delay time is 0.4 to 0.8 sec and the upset displacement speed is 5.0 to 70.0 mn/sec to form a flash having a flash root radius of 0.5 mm or more and a flash root angle of 75.degree. or less.
    Type: Grant
    Filed: November 30, 1998
    Date of Patent: August 22, 2000
    Assignee: Nippon Light Metal Company Ltd.
    Inventors: Hiroyuki Mochizuki, Harumichi Hino, Masayuki Kobayashi
  • Patent number: 6092631
    Abstract: If cylinder bores formed in a caliper parallel to each other are communicated together through a pipe casted in the caliper, the pipe tends to come out of the caliper into a cylinder bore. A separate short pipe is provided to communicate the cylinder bores. The pipe has an engaging portion so as to extend in a diametric direction of the short pipe to prevent longitudinal shift of the short pipe. The engaging portions can be provided easily by forming a recess or a protrusion on the outer periphery of the pipe and casting the pipe in the caliper.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: July 25, 2000
    Assignees: Sumitomo Electric Industries, Ltd., Nippon Light Metal Company, Ltd.
    Inventors: Yoshiki Matsuzaki, Masahide Hamada, Masayuki Yasuda, Nobuyuki Shimizu
  • Patent number: 5936931
    Abstract: A disc clamping device which includes at least one main body piece fixed to an end of a cylindrical main body and abutted against the outer peripheral edge of a disc, a plunger slidingly disposed in the cylindrical main body, a shaft fitted to an end of the plunger and an extreme end piece attached to an end of the shaft and pressed against the peripheral edge of the center hole of the disc, is further provided with stop means for positioning the extreme end piece on the shaft according to a diameter of the disc and turning prevention means screwed to the other end of the plunger so as to prevent the turning of the shaft. With this arrangement, the disc clamping device can cope with discs having various diameters and further the occurrence of warp and scratch of the disc can be prevented.
    Type: Grant
    Filed: May 23, 1997
    Date of Patent: August 10, 1999
    Assignee: Nippon Light Metal Company Ltd.
    Inventors: Yasushi Kobayashi, Hiroki Koyanagi, Toshiyuki Saito
  • Patent number: 5916635
    Abstract: This invention relates to water-based hydrophilic coatings suitable for giving hydrophilicity primarily to the surface of aluminum and to a process for manufacturing precoated fin materials for heat exchangers with use of said coatings. The coatings are composed of colloidal silica with a dispersed particle diameter of 5 to 100 nm, water-soluble polymers containing at least carboxylic acid polymers, anionic surfactants and water; the colloidal silica and the water-soluble polymers are present at a weight ratio of 30:70 to 70:30 on a solid basis in a combined content of 4 to 20% by weight, the content of carboxyl group in the carboxylic acid polymers contained in the water-soluble polymers is 20 to 63% by weight, the anionic surfactants are alkali salts of sulfosuccinic acid monoalkyl esters with alkyl groups containing 1 to 18 carbon atoms and present in an amount of 5 to 20% by weight of the combined solid content of the colloidal silica and the water-soluble polymers, and the pH is 1 to 5 as a whole.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: June 29, 1999
    Assignee: Nippon Light Metal Company, Ltd.
    Inventors: Toru Ishii, Kazuhiko Yamazaki, Reiko Takasawa
  • Patent number: 5892278
    Abstract: An aluminum or aluminum alloy radiator possessing high reliability and excellent heat dissipation is provided. A process for producing an aluminum alloy radiator is also provided which has improved adhesion between the radiator and the mold resin and can prevent cracking in a resin molded portion.The aluminum alloy radiator, for a plastic molded type semiconductor device, comprising an anodized aluminum-iron alloy having an iron content of 0.5 to 3.0% by weight or an anodized aluminum-silicon alloy having a silicon content of 0.5 to 3.5% by weight. The process for producing an aluminum alloy radiator for a plastic molded type semiconductor device, comprising the steps of: anodizing an aluminum alloy; and subjecting the anodized aluminum alloy to sealing, wherein the aluminum alloy radiator after the sealing is heat-treated at a temperature of 180 to 250.degree. C.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: April 6, 1999
    Assignees: Dai Nippon Printingco., Ltd., Nippon Light Metal Company, Ltd.
    Inventors: Hideo Horita, Yoichi Miura, Masato Sasaki, Yoshio Hirayama
  • Patent number: 5762728
    Abstract: To provide a wear resistance comparable with that of the conventional A390 series aluminum alloys, a reduced attacking to a sliding counterpart, and an improved machinability, a wear-resistant cast aluminum alloy comprises: a chemical composition consisting, in weight percentage of: 14.0-16.0 Si, 2.0-5.0 Cu, 0.1-1.0 Mg, 0.3-0.8 Mn, 0.1-0.3 Cr, 0.01-0.20 Ti, 0.003-0.02 P, 1. 5 or less Fe, and the balance of Al and unavoidable impurities in which the Ca content is limited to not more than 0.005; and a microstructure in which a primary Si crystal and Al-Si-Fe-MnCr-based intermetallic compounds are dispersed in the form of a crystallized particle having a diameter of from 5 to 30 gm. A process of producing a wear-resistant cast aluminum alloy includes casting a melt of the alloy composition at a cooling rate of from 50.degree. to 200.degree. C./sec.
    Type: Grant
    Filed: December 18, 1996
    Date of Patent: June 9, 1998
    Assignees: Nippon Light Metal Company Ltd., Nissan Motor Co., Ltd.
    Inventors: Yukio Kuramasu, Akio Hashimoto, Yoji Namekawa, Sanji Kitaoka, Koji Watanabe, Kenji Tsushima, Mamoru Sayashi
  • Patent number: 5762729
    Abstract: A continuously cast and rolled aluminum alloy substrate for an electrolytically grainable lithographic printing plate, consisting of 0.20 to 0.80 wt. % of Fe and the balance of Al, grain-refining elements and unavoidable impurities including 0.3 wt. % or less of Si and 0.05 wt. % or less of Cu, the amount of Fe present in solid solution being not more than 250 ppm, the amount of Si present in solid solution being not more than 150 ppm, and the amount of Cu present in solid solution being not more than 120 ppm.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: June 9, 1998
    Assignees: Nippon Light Metal Company Ltd., Fuji Photo Film Company Ltd.
    Inventors: Yasuhisa Nishikawa, Hideki Suzuki, Hirokazu Sakaki, Yoshinori Hotta
  • Patent number: 5562784
    Abstract: An aluminum alloy substrate for an electrolytically grainable lithographic printing plate, consisting of an aluminum alloy cold-rolled sheet, produced by a continuous casting and rolling process, comprising 0.20 to 0.80 wt % of Fe with the balance consisting of aluminum, grain refining elements, and unavoidable impurities including 0.3 wt % or less of Si and 0.05 wt % or less of Cu, grains in a surface layer portion having a width of not more than 150 .mu.m in a direction parallel to the sheet surface and normal to the direction of cold rolling and a length, in a direction parallel to the direction of cold rolling, of not more than 8 times the width.
    Type: Grant
    Filed: December 7, 1994
    Date of Patent: October 8, 1996
    Assignees: Nippon Light Metal Company, Ltd., Fuji Photo Film Company, Ltd.
    Inventors: Yasuhisa Nishikawa, Hideki Suzuki, Hirokazu Sakaki, Yoshinori Hotta
  • Patent number: 5532721
    Abstract: It is an object of the invention to provide a dielectric drum where manufacturing costs can be reduced while keeping pressure resistance high and having an anodic oxidized film with a uniform dielectric characteristic, and also to provide an electrostatic recording device which is inexpensive and provides a high image reliability using the dielectric drum. According to the present invention, a dielectric drum includes an aluminum substrate and a dielectric layer of an anodic oxidized film on the surface of the aluminum substrate. The aluminum substrate is produced by conducting a drawing and hardening treatment M on an aluminum alloy pipe of the 5000 series alloys of the Aluminum Association. Also, the dielectric drum is used to construct an electrostatic recording device.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: July 2, 1996
    Assignees: Fuji Xerox Co., Ltd., Nippon Light Metal Company, Ltd., Nikkei Techno-Research Co., Ltd.
    Inventors: Kazuo Asano, Koji Masuda, Takuo Kusano, Ken Ebihara
  • Patent number: 5493033
    Abstract: In the purification of crude tetrachlorophthalic anhydride containing hexachlorobenzene as impurities, this invention relates to purification by decomposition in which crude tetrachlorophthalic anhydride is contacted with chlorine gas in fuming sulfuric acid or sulfuric anhydride in the presence of iodine or iodine trichloride to decompose the impurities and remove them or purification by washing in which hexachlorobenzene is separated by washing with a chlorinated solvent. This invention also relates to a process for purifying crude tetrachlorophthalic anhydride containing iodotrichlorophthalic anhydrides as impurities by applying a radical reaction treatment in a chlorinated solvent to convert iodotrichlorophthalic anhydrides to tetrachlorophthalic anhydride. Moreover, it relates to high-purity tetrachlorophthalic anhydride containing 10 ppm or less of hexachlorobenzene.
    Type: Grant
    Filed: June 1, 1994
    Date of Patent: February 20, 1996
    Assignee: Nippon Light Metal Company, Ltd.
    Inventors: Kyoichi Tomita, Zentaro Ueda, Seiji Maekawa
  • Patent number: 5240519
    Abstract: An aluminum alloy consisting of: 1.0-1.5 wt % Si, 0.4-0.9 wt % Cu, 0.2-0.6 wt % Mn, 0.8-1.5 wt % Mg, 0.3-0.9 wt % Cr, 0.03-0.05 wt % Ti, 0.0001-0.01 wt % B, and the balance consisting of Al and unavoidable impurities; the sum of the Mn and Cr contents being not more than 1.2 wt % and the content of Fe as one of the unavoidable impurities being not more than 0.2 wt %. The alloy may further comprise 0.1-0.2 wt % Zr to facilitate the refinement of crystal grains. The alloy has a tensile strength of 40 kgf/mm.sup.2 or more and an elongation of 15% or more when plastically formed, solution-treated and aged to provide the highest strength.
    Type: Grant
    Filed: August 17, 1992
    Date of Patent: August 31, 1993
    Assignees: Nippon Light Metal Company, Ltd., Nikkei Techno-Research
    Inventors: Hajime Kamio, Toru Yamada, Kenji Tsuchiya
  • Patent number: 5146047
    Abstract: The electric-wave absorbing material for construction includes a medium and a large number of electric-wave absorbing particles dispersed therein. The particles are in the form of capsules filled with water. The electric-wave absorbing material for construction may be made of a construction material having provided thereon an electric-wave absorbing layer which includes such electric-wave absorbing particles.
    Type: Grant
    Filed: March 7, 1991
    Date of Patent: September 8, 1992
    Assignees: Shimizu Construction Co., Ltd., Nippon Light Metal Company, Ltd.
    Inventors: Kouji Nagata, Minoru Sugita, Keisuke Kida, Toru Watanabe, Ken'yo Matsushita
  • Patent number: 5110371
    Abstract: An aluminum alloy consists of, by weight, from 0.08 to 0.50 percent silicon, from 0.15 to 0.90 percent iron, the weight ratio of iron to silicon being from 1.4 to 2.2, and the remainder aluminum, intermetallic compounds of .alpha.-type Al-Fe-Si system being contained in the alloy. A light gray oxide film is formed on the alloy by anodic treatment.
    Type: Grant
    Filed: July 9, 1991
    Date of Patent: May 5, 1992
    Assignee: Nippon Light Metal Company, Ltd.
    Inventors: Takeshi Moriyama, Katsuji Ogawa, Fumio Ohtake, Akito Nishizawa
  • Patent number: 4865823
    Abstract: A method for recovering gallium, which comprises a capturing step of contacting an aqueous solution containing gallium to a chelating agent containing a water-insoluble substituted quinolinol as the active ingredient, to let the chelating agent capture gallium, and an eluting step of contacting an eluting solution composed of an aqueous solution of an acid or strong base containing said substituted quinolinol, to the chelating agent from the capturing step, to elute gallium therefrom.
    Type: Grant
    Filed: August 3, 1988
    Date of Patent: September 12, 1989
    Assignees: Mitsubishi Chemical Industries Limited, Nippon Light Metal Company, Ltd.
    Inventors: Yukinori Minagawa, Minoru Tanaka, Kunihiko Yamaguchi, Kazumasa Arai, Gouichi Muramatsu
  • Patent number: 4741174
    Abstract: This invention relates to an apparatus comprising a double walled container in which a heat regenerating agent is sealed, a heat insulating ring mounted on the upper periphery of said double walled container, a supporting shoulder located on the external periphery of said heat insulating ring, an engaging portion located at the lower periphery of said supporting shoulder, and a mating portion located on a cover for detachably mounting in engageable mating portion provided in a handle projecting from said external case.
    Type: Grant
    Filed: April 24, 1987
    Date of Patent: May 3, 1988
    Assignee: Nippon Light Metal Company, Ltd.
    Inventor: Susumu Uesaka
  • Patent number: 4536264
    Abstract: A method for continuously electrolytically processing a metal web in which the consumption rate of graphite electrodes is remarkably reduced. Auxiliary anodes made of a nonreactive material are provided separately from the graphite electrodes. One half of a symmetrical waveform is applied directly between the graphite electrodes, while for the other half of the waveform, a portion of the current is distributed through the auxiliary anodes. In this manner, the magnitude of the current contributing to a cathode reaction on the surfaces of the graphite electrodes is made larger than the magnitude of the current contributing to an anode reaction on the surfaces of the graphite electrodes, thereby reducing the consumption rate of the graphite electrodes.
    Type: Grant
    Filed: September 21, 1984
    Date of Patent: August 20, 1985
    Assignees: Fuji Photo Film Co., Ltd., Nippon Light Metal Company, Ltd.
    Inventors: Takanori Masuda, Tsutomu Kakei, Teruo Miyashita, Akira Morita, Masahiro Takahashi
  • Patent number: 4533444
    Abstract: A method of electrolytic treatment on the surface of metal web, such as may be employed to fabricate offset printing plates supports, in which the rate of consumption of graphite electrodes used with the process is remarkably reduced. A current having asymmetric positive and negative half cycles is applied between graphite electrodes disposed in a main cell. A portion of the current of the half cycle having the larger average value is applied to an auxiliary anode electrodes provided in an independent auxiliary cell separated from the graphite electrodes. The auxiliary electrode is made of an insoluble material. By making the current density for anode reaction on the surfaces of the graphite electrodes smaller than the current density for cathode reaction on the surfaces of the graphite electrodes, the consumption rate of the graphite electrodes is greatly reduced.
    Type: Grant
    Filed: May 17, 1984
    Date of Patent: August 6, 1985
    Assignees: Fuji Photo Film Co., Ltd., Nippon Light Metal Company Ltd.
    Inventors: Kazutaka Oda, Hisao Ohba, Teruo Miyashita, Akira Morita, Masahiro Takahashi
  • Patent number: 4518466
    Abstract: A web conveying method and apparatus in which a metal web is maintained substantially parallel to an adjacent electrode despite fluctuations in the flow of an electrolytic solution in which the web is immersed. A guide plate is disposed adjacent the web on the side thereof opposite the electrode. A plurality of through-holes are formed in the guide plate which are evenly distributed thereon. Due to the flow of solution through the guide plate, a static pressure is applied to the web which maintains it substantially parallel at all times to the electrode.
    Type: Grant
    Filed: December 9, 1983
    Date of Patent: May 21, 1985
    Assignees: Fuji Photo Film Co., Ltd., Nippon Light Metal Company Ltd.
    Inventors: Masahiro Takahashi, Toshio Hagiwara, Tsutomu Kakei, Kazutaka Oda
  • Patent number: 4457819
    Abstract: The present invention provides a method of delustering an electrocoated article which comprises dipping an uncured electrocoated article into an aqueous solution of an organic sulfonic acid, and applying electric voltage to the article. Further, the present invention provides a method of controlling the gloss of an electrocoated article which comprises electrocoating an article while applying pulsating electric current voltage, dipping the obtained electrocoated article in an aqueous solution of an organic sulfonic acid in an uncured state, and applying electric voltage to the electrocoated article as anode, wherein certain pulsating ratio at electrocoating is selected. According to the present invention, an even delustered coat having excellent physical properties is obtained. Further, it is possible to deluster the electrocoat to a desirable gloss with eveness.
    Type: Grant
    Filed: December 28, 1982
    Date of Patent: July 3, 1984
    Assignees: Nippon Paint Co., Ltd., Nippon Light Metal Company Ltd.
    Inventors: Hisao Kirino, Yukinobu Yabumoto, Takashi Iritani, Masao Suga, Yukinaga Nakanishi, Masaru Itoh
  • Patent number: D398207
    Type: Grant
    Filed: June 13, 1997
    Date of Patent: September 15, 1998
    Assignee: Nippon Light Metal Company Ltd.
    Inventor: Yasushi Kobayashi