Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C.

Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70-2.15 g/cm3 and contains 5×104−5×106 bubbles per cm3, said bubbles having an averaged diameter of 10-100 &mgr;m; and the transparent portion has an apparent density of 2.19-2.21 g/cm3 and the amount of bubbles having a diameter of at least 100 &mgr;m in the transparent portion is not more than 1×103 per cm3. The opaque silica glass article is made by a process wherein a mold is charged with a raw material for forming the opaque portion, which is a mixture comprising a silica powder with a small amount of a silicon nitride powder, and a raw material for forming the transparent portion so that the two raw materials are located in the positions corresponding to the opaque and the transparent portions, respectively, of the silica glass article to be produced; and the raw materials are heated in vacuo to be thereby vitrified.

Abstract: A high-purity transparent silica glass containing Fe, Na and K impurities each in an amount of 0.01-0.3 ppm, and an OH group in an amount of 0-3 ppm; among the Fe impurities, the content of metallic Fe having a valency of +0 being not larger than 0.1 ppm. This transparent silica glass exhibits, even when it is maintained at 900-1,400.degree. C. for at least 20 hours, an extinction coefficient of not larger than 0.009 at a wavelength of 400 nm, and does not become colored as visually examined. The silica glass is made by a process wherein powdery silica filled in a mold cavity is melted at 1,700.degree. C. or higher, characterized in that the melting is conducted in a graphite mold having a porous high-purity graphite layer provided on the mold inner surface so that the filled silica is not contacted with the mold; said porous layer having a bulk density of 0.1-1.5 g/cm.sup.3, and the content of each of Fe, Na and K impurities in the porous layer being not larger than 1 ppm.

Abstract: Pure transparent quartz glass is provided by molding powdery amorphous silica into an article, converting the molded powdery amorphous silica into crystalline silica of high-temperature type cristobalite structure, and then fusing the crystalline silica, the quartz glass containing impurities respectively at a content of not higher than 1 ppm, and an OH group at a content of not higher than 20 ppm, and having a viscosity of 10.sup.12.0 poise or more at 1200.degree. C. The quartz glass is transparent and has high purity, and is excellent in high temperature viscosity characteristics. The quartz glass can be produced at a low cost.

Abstract: The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.

Abstract: An apparatus for producing fused silica includes at least one anodic plasma arc electrode and at least one cathodic plasma arc electrode adjustably arranged with respect to one another so that the plasma arcs formed thereby couple together to form a plasma arc coupling zone. A feedstock material is fed into a region between the electrodes or to a region near the electrodes where the plasma arc coupling zone is formed. A platform is located beneath the plasma arc coupling zone to receive the silica product which is formed in the plasma arc coupling zone. The platform may be rotated about its axis and move up and down along its axis. A cooling device also may be included with the platform. The plasma anode torch used in the apparatus includes a cylindrical nozzle with a non-consumable, copper, blunt ended electrode disposed therein. A channel is provided between the electrode and the nozzle wall to allow the plasma gas to pass through the torch.

Abstract: Method for the production of fused silica in which a particulate silica feedstock material is passed from a silica feed tube through or near a plasma arc coupling zone in which at least two plasma arcs of opposite polarity are coupled, thereby raising the temperature of the feedstock material and collecting the material as fused silica.

Abstract: A back lighting device for a liquid crystal display has a light scattering coating in the form of dots covering the light emitting surface of a photo-conductive plate. The coating covers 3-50% of the surface nearest an end thereof adjacent a linear light source and covers 80-100% of the surface farthest from the light source. The variation of the coating rate across the surface produces uniform distribution of emitted light from the back lighting device.

Abstract: A light transmitting rod (22) on an end surface of which is disposed a reflecting mirror (26) and on the other end surface of which is mounted a lamp (44) as a light source for emitting light into the light transmitting rod (22) is attached to a base (12), and a diffusion stripe (24) is formed by applying fine powder having a high refractive index to the outer circumferential surface of the light transmitting rod (22) in a rectilinearly pin-striped manner along the axial direction thereof, whereby an even linear light profile of high luminous energy level and having uniform luminous energy as well as no polarization which is also irradiation light having a small light distribution beam angle and being substantially parallel rays can be obtained. As a result, it is possible to provide a light source unit used suitably in business and office machines such as an image scanner, an optical printer, a monochromatic copying machine, a color copying machine, a facsimile machine and the like.