Patents Assigned to Nissin Inc.
  • Patent number: 6744211
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: June 1, 2004
    Assignees: Nissin Inc., Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Publication number: 20020047543
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Application
    Filed: October 10, 2001
    Publication date: April 25, 2002
    Applicant: NISSIN INC.
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Patent number: 6339297
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: January 15, 2002
    Assignees: Nissin Inc., President of Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Patent number: 6184623
    Abstract: A plasma generating apparatus and a method for controlling plasma-generating high frequency power capable of appropriately and easily controlling plasma density over the long term are disclosed. Measuring high frequency power is supplied to plasma through a dielectric tube. Apart from a supply system of plasma-generating high frequency power, there is provided a plasma density information obtaining section having long lifetime no hot filament. The plasma density information obtaining section obtains the plasma density information by measuring a physical amount related to reflection or absorption of the high frequency power. An actually measured plasma density monitored by the plasma density information obtaining section from moment to moment and a target plasma density held in a plasma density setting section are compared.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: February 6, 2001
    Assignees: Nissin Inc., Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda