Patents Assigned to Nisso Engineering Co., Ltd.
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Publication number: 20130022507Abstract: A tubular flow reactor comprises at least two fluid feed channels made of a multi-walled tube for feeding at least two kinds of fluids to be used in a reaction, a reaction channel having an annular cross section that can cause the fluids to react while flowing the same therethrough, and a fluid discharge channel for discharging a reaction product. The fluid feed channels are so connected as to communicate with an inlet of the reaction channel along a peripheral tangential direction or along a direction perpendicular to a peripheral surface of the annular reaction channel, and the fluid discharge channel is so connected as to communicate with an outlet of the reaction channel.Type: ApplicationFiled: April 1, 2011Publication date: January 24, 2013Applicant: NISSO ENGINEERING CO., LTD.Inventor: Eiichiro Kobayashi
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Publication number: 20120152723Abstract: A tubular flow reactor which comprises a plurality of inflow channels for introducing at least two kinds of fluids to cause a reaction; a reaction tube having an internal space for merging the fluids and causing the merged fluids to flow through to cause a reaction; an outflow channel for discharging the reaction product from the reaction tube; and a rod-shaped ultrasonic emitter placed at the flow-merging portion of the internal space of the reaction tube; wherein the inflow channels and the outflow channel are connected to the reaction tube such that their respective internal spaces communicate with the internal space of the reaction tube; and an ultrasonic wave can be emitted from the rod-shaped ultrasonic emitter to the fluid passing through the reaction tube.Type: ApplicationFiled: September 3, 2010Publication date: June 21, 2012Applicant: NISSO ENGINEERING CO., LTD.Inventor: Akira Yoneya
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Publication number: 20120035392Abstract: A tubular flow type reactor comprising: (1) inflow channels for respective inflow of at least two kinds of fluids to be used in a reaction, (2) an outer tube having a lumen that is capable of merging the fluids and of distributing the merged fluids for the reaction, (3) an outflow channel for outflow of a reaction product from the outer tube, and (4) an inner tube disposed in the lumen of the outer tube, wherein an annular flow channel is formed between the outer tube and the inner tube, and the inflow channels are connected to the outer tube along the direction tangential to the internal circumference of the outer tube in such a manner that the lumens of the inflow channels communicate with the lumen of the outer tube, i.e., the annular flow channel.Type: ApplicationFiled: March 24, 2010Publication date: February 9, 2012Applicant: NISSO ENGINEERING CO., LTD.Inventors: Eiichiro Kobayashi, Norihira Fukuzawa
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Patent number: 6444589Abstract: An etching method and an etching apparatus for applying an etchant containing nitric acid and hydrofluoric acid to silicon to etch the silicon. The etchant used in etching is recovered, and brought into contact with a gas inert to the etchant, whereby the etchant is regenerated. At least a part of the regenerated etchant is reused in etching.Type: GrantFiled: July 13, 2000Date of Patent: September 3, 2002Assignees: Nisso Engineering Co., Ltd., Disco CorporationInventors: Akira Yoneya, Noriyuki Kobayashi, Nobuhiko Izuta
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Patent number: 6098848Abstract: The object of the present invention is to simplify the process of connecting a reservoir for charging and discharging 2 or more fluids with a pipeline for conveying said fluid and to assist the automation of this process.Type: GrantFiled: December 18, 1998Date of Patent: August 8, 2000Assignees: Nisso Engineering Co., LTD, Kanto Kagaku Kabushiki KaishaInventors: Tsutomu Kawashima, Koji Ueda, Tsugio Saito, Kenji Kageyama
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Rotary cleaning method with chemical solutions and rotary cleaning apparatus with chemical solutions
Patent number: 5487398Abstract: To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a new cleaning method and apparatus, simplifying the recovery of waste liquids, and decreasing equipment investment.A cleaning method having a plurality of chemical-solution-cleaning processes characterized by performing a chemical-solution-cleaning process for continuously feeding a chemical solution to the surface of an object to be cleaned from an upper part of the object surface by horizontally setting the object in a cleaning bath, closing the bath, and then rotating the object and an ultrapure-water-cleaning process for feeding ultrapure water in order for each chemical solution in the same cleaning bath; and thereafter drying the object after cleaning it.Type: GrantFiled: June 20, 1994Date of Patent: January 30, 1996Assignees: Tadahiro Ohmi, Nisso Engineering Co., Ltd., MTC Co., Ltd.Inventors: Tadahiro Ohmi, Naomichi Yonekawa, Hiroyuki Horiki, Toshimitsu Kaji, Fumitomo Kunimoto, Takeo Tamaki -
Patent number: 5472244Abstract: A plastic coupling for plastic tubing having a groove annulus formed between a first circumferential groove on the outer periphery of the enlarged diameter portion of a connection tube and a second circumferential groove on the inner periphery of a cap nut 5 when the cap nut 5 is mounted on a joint body, and an enlargeable split ring having an internal diameter smaller than the external diameter of the enlarged diameter portion and loosely fitted into the second groove, the split ring being adapted to slide on the enlarged diameter portion to the first groove until the split ring falls within the first groove and is located within the groove annulus when the cap nut is mounted on the joint body.Type: GrantFiled: July 29, 1994Date of Patent: December 5, 1995Assignees: Nisso Engineering Co., Ltd, Fluoroware, Inc.Inventors: Yasukatsu Nishikata, Hidenori Maeba, Takao Nakazawa
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Patent number: 5470421Abstract: A method for purifying an etching solution consisting of an aqueous phosphoric acid solution which has been used in etching of a silicon nitride film. In the process, hydrogen fluoride is added to an etching solution consisting of an aqueous phosphoric acid solution which has been used for etching of a silicon nitride film, and the resulting solution is heated to remove fluorides of silicon as reaction products of hydrogen fluoride with silicon compounds which have been contained in the etching solution together with vaporized water.Type: GrantFiled: September 15, 1994Date of Patent: November 28, 1995Assignee: Nisso Engineering Co., Ltd.Inventors: Akira Nakada, Akira Yoneya, Noriyuki Kobayashi, Mamoru Katayanagi, Tsutomu Kawashima, Hiroshi Yoshida
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Patent number: 4775267Abstract: Disclosed is a pneumatic conveyor system for powder. The conveyor system includes a powder feeder, a bent pipe, a transport pipe, a first air supply nozzle connected to an upper pipe member of the bent pipe, and a second air supply nozzle connected to a curved pipe member of the bent pipe oppositely to the lower end opening of a converging pipe portion of the curved pipe member. Alternate supply of air from the first and second air supply nozzles to the bent pipe is effected intermittently at a predetermined interval of time, so that the power is compacted and formed into a lump of clean powder plug.Type: GrantFiled: February 12, 1987Date of Patent: October 4, 1988Assignee: Nisso Engineering Co., Ltd.Inventor: Takashi Yamamoto