Patents Assigned to Nittou Chemical Industries, Ltd.
  • Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
    Patent number: 6805135
    Abstract: A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt % ethylene glycol monobutyl ether, 0.5 wt % surfactant, and 9.5 wt % water. The content of an alkali metal in the cleaning solution is set to be less than 10 ppb.
    Type: Grant
    Filed: November 24, 2000
    Date of Patent: October 19, 2004
    Assignees: Nittou Chemical Industries, Ltd., Tokyo Electron Limited
    Inventors: Kenichi Hirota, Hitoshi Yamada, Kiyoshi Yuasa, Eiji Yamaguchi, Shinichi Kawaguchi, Takahiro Shimoda, Nobuyuki Nagayama