Patents Assigned to NKT Research A/S
  • Patent number: 7238395
    Abstract: The invention relates to method of coating the surface of an inorganic substrate of glass, silicon dioxide, ceramics or carbon, which method comprises a step of cleaning the surface of the substrate by subjecting the surface to a reducing gas plasma, a step of activating the surface by generating radicals on the surface of the substrate by subjecting the surface to a reducing gas plasma and forming a first layer on the substrate surface using a plasma enhanced polymerization process employing one or more monomers comprising monomers with a sufficient low molecular weight for them to be in their gaseous state in the gas plasma, selected from the group consisting of C1-C16 alkanes, C2-C16 alkanes, C2-C16 alkynes, C2-C16 alkynes, styrene, aromatic monomers of styrene compounds, monomers of vinyl- and acrylate-compounds.
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: July 3, 2007
    Assignee: NKT Research A/S
    Inventor: Bjørn Winther-Jensen
  • Patent number: 6775455
    Abstract: An integrated silicon mesa structure integrated in a glass-on-silicon waveguide, and a method of manufacturing it. The silicon mesa waveguide is integrated in a glass-on-silicon waveguide composed of a wave-guiding core between lower and upper sheath layers having a refractive index lower than the index of the wave-guiding core. The silicon mesa structure is preferably made of the silicon substrate, and a low loss silicon mesa waveguide is formed by removing excess material below the mesa structure. Further, transitions between the glass-on-silicon waveguide the the silicon mesa waveguide section are preferably formed such that transmission of light passing the transitions is adiabatic.
    Type: Grant
    Filed: August 26, 2002
    Date of Patent: August 10, 2004
    Assignee: NKT Research A/S
    Inventor: Kent Erik Mattsson
  • Patent number: 6482371
    Abstract: A process for the separation of heavy metal and halogen from unwanted waste material or residue. Halogen is selectively extracted or washed out from the waste material. Metal is selectively extracted or washed out from the essentially halogen free waste material.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: November 19, 2002
    Assignee: NKT Research A/S
    Inventor: Erik Rasmussen
  • Patent number: RE39000
    Abstract: A method of modifying the surface of a solid polymer substrate comprising the steps of a) generating radicals on the substrate surface by subjecting it to a gas plasma or by subjecting it to UV light, and b) treating the surface with a vapor of a monomer or a monomer mixture comprising cyano acrylate and/or isocyanate, where step b) starts before step a), simultaneously with step a), under step a), or follows immediately after step a), and a polymer substrate modified accordingly; a method of binding an organic binder material to a surface of a solid polymer substrate comprising the steps of modifying the surface of the substrate by said method, and bringing the organic material in contact with the surface of the substrate, and a polymer bonded to an organic material by the last mentioned method.
    Type: Grant
    Filed: June 27, 1997
    Date of Patent: March 7, 2006
    Assignee: NKT Research A/S
    Inventors: Kristian Glejbol, Bjorn Winther-Jensen