Abstract: A temperature control system, a wafer chuck, a thermal module for use with the chuck, and an apparatus for use in semiconductor manufacture are disclosed herein. The temperature control system includes: a target having a temperature, a fluid circulation loop coupled to the target for controlling the temperature of the target, a heating heat exchanger coupled to the fluid circulation loop for selectively providing heat to the fluid circulation loop, a cooling heat exchanger coupled to the fluid circulation loop for selectively providing cooling to the fluid circulation loop and a plurality of thermal electric elements carried by the target for selectively providing heating or cooling to the target. The heating heat exchanger and cooling heat exchanger provide gross control of the temperature of the target, and the plurality of thermal electric elements provide fine control of the temperature of the target.

Abstract: A temperature control system for a semiconductor manufacturing process having at least one target includes: a heat exchange loop operatively associated with each target, and a mixing valve operatively associated with each heat exchange loop. This mixing valve has a body defining a mixing chamber. The mixing chamber has an inlet, an outlet, a hot inlet, a cold inlet, and a closure means associated with each inlet. Alternatively, the mixing valve may include: a body defining a mixing chamber, the mixing chamber having an inlet, an outlet, a hot inlet, and a cold inlet, a moveable gate operatively associated with each inlet for controlling the flow of fluid through said inlets, and a motor for moving the gates. A process for manufacturing semiconductors includes the step of providing a temperature control system having at least one target including a mixing valve, as described above.

Abstract: A temperature control system, a wafer chuck, a thermal module for use with the chuck, and an apparatus for use in semiconductor manufacture are disclosed herein. The temperature control system includes: a target having a temperature, a fluid circulation loop coupled to the target for controlling the temperature of the target, a heating heat exchanger coupled to the fluid circulation loop for selectively providing heat to the fluid circulation loop, a cooling heat exchanger coupled to the fluid circulation loop for selectively providing cooling to the fluid circulation loop and a plurality of thermal electric elements carried by the target for selectively providing heating or cooling to the target. The heating heat exchanger and cooling heat exchanger provide gross control of the temperature of the target, and the plurality of thermal electric elements provide fine control of the temperature of the target.

Abstract: A temperature control device for use in a process reactor system with a bubbler having a container provided with a side wall. The device includes a vessel having an internal chamber adapted to receive the container of the bubbler. An enclosure member is extendable between the container of the bubbler and the vessel for enclosing the side wall of the container within the internal chamber. A temperature-changing device is coupled to the vessel for providing heat or cold to the internal chamber.

Abstract: An apparatus for use with a process liquid for controlling the temperature of a semiconductor-processing target comprises first and second tanks adapted for holding process liquid, at least one fluid level sensor carried by the first tank for monitoring the amount of process liquid in the first tank, and a valve coupled to one of the at least one fluid level sensor and configured to increases the flow of process liquid from the second tank to the target when the amount of process liquid in the first tank drops to a first predetermined amount. The first tank may include first and second compartments partially separated by a divider with a top whereby process liquid in the first compartment flows over the top of the divider into the second compartment.