Abstract: A compact disc coating apparatus includes a first station for dispensing a quantity of lacquer on the disc surface and for spinning the disc to distribute a coating of lacquer over the disc surface, a second station, and a transfer assembly. The transfer assembly includes a pickup head for loading the disc into the first station and a gripper for transferring the disc from the first station to the second station. The gripper includes a rotatable disc gripping mechanism which clamps the disc during spinning at the first station. As soon as the disc stops spinning, the gripper lifts the disc from the first station.

Abstract: Apparatus for locking a workpiece, such as a compact disc, in a vacuum chamber includes a locking mechanism, movable between a locked position and an unlocked position, and a sealed bellows assembly that is coupled to the locking mechanism. The locking mechanism is automatically actuated by the bellows assembly between the locked and unlocked positions when the pressure in the chamber is changed by a predetermined amount. The locking apparatus is preferably used for locking the compact disc to a disc holder during processing and/or handling.

Abstract: A compact disc coating apparatus includes a first station for dispensing a quantity of lacquer on the disc surface and for spinning the disc to distribute a coating of lacquer over the disc surface, a second station, and a transfer assembly. The transfer assembly includes a pickup head for loading the disc into the first station and a gripper for transferring the disc from The first station to the second station. The gripper includes a rotatable disc gripping mechanism which clamps the disc during spinning at the first station. As soon as the disc stops spinning, the gripper lifts the disc from the first station.

Abstract: A magnetron sputtering cathode assembly provides an annular target of sputtering material located with a sputtering surface facing a substrate to be sputtered. An inner magnet and an outer ring magnet are positioned adjacent inner and outer edges of the sputtering surface. The outer ring magnet is oriented so that its North-to-South magnetic orientation is substantially parallel to the plane defined by the sputtering surface while the inner magnet is oriented so that its North-to-South magnetic orientation is substantially perpendicular to the plane defined by the sputtering surface. A pair of walls extend at the inner and outer edges of the annular target away from the sputtering surface and toward the substrate. The walls and the magnets define a closed-loop array of radial magnetic lines having improved target erosion and plasma-containing characteristics.