Abstract: According to one aspect of the present invention, a multi-charged particle beam writing method includes performing allocation, with respect to each irradiation-unit-region-set of a plurality of irradiation-unit-region-sets, in order that one of a dose and an irradiation time of an irradiation unit region to which one group of a plurality of groups has been assigned can become more than one of a dose and an irradiation time of an irradiation unit region, in a same irradiation-unit-region-set, to which another group of the plurality of groups has been assigned, in such a manner that at least a part of the one of the dose and the irradiation time of the irradiation unit region to which the another group has been assigned is allocated to the irradiation unit region to which the one group has been assigned.

Abstract: A drawing data examination method acquires coordinates representing the positions of a plurality of control points forming the B-spline curve; sets, as an examination target region of the drawing data, a region surrounded by a line segment connecting at least three or more control points adjacent to each other in the drawing data with a straight line after acquiring the coordinates; performs calculation processing of specifying a relative position of an examination target control point with respect to the examination target region by using the coordinates of the examination target control point and control points of the examination target region with respect to the examination target region; and determines whether the figure of the drawing data has an intersection by determining whether the examination target control point exists inside the examination target region based on the relative position.

Abstract: In one embodiment, a charged particle beam writing apparatus includes a high-voltage power supply configured to apply an acceleration voltage for charged particles to an emission unit, a deflector configured to deflect a charged particle beam emitted from the emission unit, a discharge sensor configured to output an output value indicating a change in a case where a discharge occurs in a column in which the emission unit and the deflector are arranged or in the high-voltage power supply, and a discharge detection control unit configured to convert the output value from the discharge sensor into a conversion value with the same sign, calculate an integral value of the conversion value over a fixed period of time, and determine, based on the integral value, whether or not a discharge that causes a pattern error has occurred.

Abstract: According to one aspect of the present invention, a dose information correction method includes: setting a reference correction amount for correcting the dose information; calculating, for each mesh region, a gradient of the dose information defined for a mesh region by using the dose information defined for the mesh region and the dose information defined for a peripheral mesh region around the mesh region; calculating, for each mesh region, an individual correction amount of the dose information of the mesh region to be applied along a direction of the gradient by using a value of a calculated gradient and the reference correction amount; and generating and outputting a corrected dose information map in which corrected dose information obtained by correcting the dose information of the mesh region using a calculated individual correction amount is defined for each mesh region.

Abstract: According to one aspect of the present invention, a stage mechanism includes four or more support members configured to include a first support member whose upper end is arranged at a first height, and a second support member whose upper end is arranged at a second height lower than the first height, wherein any one of the plurality of substrates is supported by either one of by respective upper ends of support members of a first group which is composed of three or more support members including the first support member in the four or more support members, and by respective upper ends of support members of a second group which is composed of three or more support members including the second support member in the four or more support members.

Abstract: In one embodiment, a data processing method includes acquiring a plurality of first control points of a first parametric curve representing a curve edge of a pattern defined in writing data, acquiring bias amounts for points on the first parametric curve corresponding to a plurality of parameter values, and determining a plurality of second control points such that norms of positional differences between points obtained by shifting the points on the first parametric curve by the bias amounts and points corresponding to the plurality of parameter values on a second parametric curve represented by the plurality of second control points, become small.

Abstract: In one embodiment, a graphic data generation method includes receiving first graphic data in which a plurality of graphics are defined, and adding, in accordance with presence/absence of an adjacent graphic, adjacency information including the presence/absence of the adjacent graphic to each of the plurality of graphics to generate second graphic data to be used in a quantum beam writing device.

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes an inspection power supply connected to at least one contact point of a plurality of contact points, and configured, in a state in which a retarding potential has been applied to the plurality of contact points, to apply an inspection electric potential to be superimposed on the retarding potential, and a current detector connected to at least one other contact point which is different from the at least one contact point of the plurality of contact points, and configured, in a state in which the retarding potential has been applied to the plurality of contact points, and, further, the inspection electric potential has been applied, superimposed on the retarding potential, to the at least one contact point, to detect a current flowing through the at least one other contact point.

Abstract: An electronic device includes a substrate, an electrode extending toward a side opposite to the substrate in a first direction, and a wiring portion provided between the substrate and the electrode in the first direction. The wiring portion includes an insulating layer having a first face located on the side opposite to the substrate in the first direction, a wiring layer provided in the insulating layer, and an opening portion reaching the wiring layer from the first face of the insulating layer. The opening portion includes a first portion extending in a second direction orthogonal to the first direction, and a second portion protruding from the first portion in a direction orthogonal to the first direction and crossing the second direction. The electrode being provided on the first face and is connected to the wiring layer at the first portion and the second portion of the opening portion.

Abstract: A multi-beam writing apparatus includes a stripe region generation circuit configured to generate a plurality of first stripe regions by dividing a writing region of the substrate such that a longer direction of each of the plurality of first stripe regions is in a first direction, and a plurality of second stripe regions by dividing the writing region of the substrate such that a longer direction of each of the plurality of second stripe regions is in a second direction having a predetermined relative angle to the first direction, and a writing mechanism configured to perform writing to a group of the first stripe region and the second stripe region while moving the irradiation region of the multiple beams between the first stripe region and the second stripe region in a same group during one movement of a stage to move the writing in a writing direction.

Abstract: In one embodiment, a charged particle beam writing method is provided for writing a pattern on a substrate using a charged particle beam. The charged particle beam writing method includes virtually dividing a writing region of the substrate into a plurality of first mesh regions having a first mesh size, calculating a pattern area density of each of the first mesh regions to create a first area density map, sampling the first area density map with second mesh regions having a second mesh size smaller than the first mesh size, and creating a second area density map that defines a pattern area density for each of the second mesh regions, calculating an irradiation amount for each of the second mesh regions using the second area density map, and irradiating the substrate with the charged particle beam in the calculated irradiation amount.

Abstract: According to one aspect of the present invention, a mark position measurement apparatus includes a mark position calculation circuit configured to calculate, in a state where the height position of the target object has been controlled to be the predetermined height position, positions of marks by using change of a signal for a mark of the marks due to a state of a surface of the target object, obtained by the sensor by scanning the laser beam over the marks such that the laser beam intersects the marks, and a positional deviation amount calculation circuit configured to calculate a positional deviation amount deviated from a calculated position of a mark concerned of the marks, by using an incident angle of the laser beam, and surface height positions of the target object at the positions of the marks acquired from the height position distribution of the surface of the target object.

Abstract: A pattern inspection apparatus includes an illumination optical system to illuminate an inspection substrate on which a pattern is formed, an offset calculation circuit to calculate an offset amount which depends on an image accumulation time of each of a plurality of photo sensor elements arrayed two-dimensionally, a time delay integration (TDI) sensor to include the plurality of photo sensor elements, to acquire an image of the inspection substrate by receiving a transmitted light or a reflected light from the inspection substrate by the plurality of photo sensor elements, to correct, using the offset amount, a pixel value of optical image data of an acquired image, and to output the optical image data having been corrected, and a comparison circuit to compare an optical image formed by the optical image data output from the TDI sensor with a reference image.

Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.

Abstract: In one embodiment, an alignment method is for aligning a first aperture array substrate and a second aperture array substrate disposed sequentially. The first aperture array substrate has a plurality of first openings, and the second aperture array substrate has a plurality of second openings. The alignment method includes irradiating a plurality of first openings with a charged particle beam to form a first beam array, measuring, by the first beam array, at least one of an amount of charged particles irradiating the second aperture array substrate, an amount of charged particles irradiating and reflected from or generated at the second aperture array substrate, and an amount of charged particles irradiating the second aperture array substrate and passing through the plurality of second openings, and adjusting a relative position between the first beam array and the plurality of second openings based on a measured charged particle amount.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes an angle calculation circuit configured to calculate an adjustment angle for a ½ wave plate based on which a ratio between a light intensity of a first incident light entering a first light intensity sensor and a light intensity of a second incident light entering a second light intensity sensor becomes a desired ratio; and a transmittance calculation circuit configured to calculate a transmittance of a neutral density filter based on which a light intensity of the first incident light entering the first light intensity sensor becomes a value within a desired range set for the first light intensity sensor and a light intensity of the second incident light entering the second light intensity sensor becomes a value within a desired range set for the second light intensity sensor.

Abstract: In one embodiment, a charged particle beam writing apparatus includes a charged particle beam source configured to emit a charged particle beam that is irradiated onto a substrate to be written, a deflector configured to deflect the charged particle beam to a desired irradiation position on the substrate, a detector configured to detect electrons reflected or emitted from the substrate toward the deflector, a correction amount generation unit configured to calculate a drift amount of the charged particle beam irradiated onto the substrate from a current amount obtained from the detected electrons and a time elapsed from detecting the current to performing correction, and to generate a correction amount for irradiation position misalignment based on the drift amount, and a control unit configured to correct the irradiation position based on shot data of the charged particle beam generated from writing data and the correction amount.

Abstract: A charged-particle beam irradiation apparatus includes a deflector, a shot data generator generating shot data including a shot number of a charged-particle beam, a deflection controller controlling deflection of the charged-particle beam, a stage controller, an irradiation controller controlling irradiation of the charged-particle beam based on the shot data, and a storage controller configured to, when the irradiation of the charged-particle beam is stopped due to an abnormality occurring in a constituent element other than the irradiation controller, which includes at least one of the shot data generator, the deflection controller, and the stage controller, cause a storage to store therein at least the shot number at the stop of the irradiation, wherein when a condition for resuming the irradiation is satisfied, the irradiation controller resumes the irradiation from a shot number next to the shot number stored in the storage at the stop of the irradiation.