Patents Assigned to NuFlare Technology, Inc.
  • Publication number: 20240242922
    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode. The two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam. The three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.
    Type: Application
    Filed: October 25, 2023
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Hirofumi MORITA, Haruyuki NOMURA
  • Publication number: 20240242931
    Abstract: According to one aspect of the present invention, a multiple charged particle beam writing includes: a dose representative value calculator unit configured to calculate, for each divided mesh region, a representative value of a plurality of doses of a plurality of beams with which an inside of the mesh region is irradiated as a dose representative value; a calculation processing unit configured to perform a calculation process of a rising temperature given to a mesh region of interest being one of the plurality of mesh regions by heat due to beam irradiation to each of the plurality of mesh regions in a processing region corresponding to the beam array region, the calculation process being performed by a convolution process using the dose representative value for each of the plurality of mesh regions and a thermal spread function representing thermal spread generated by the plurality of mesh regions; an effective temperature calculator unit configured to perform a repetitive process of repeating the calculati
    Type: Application
    Filed: April 26, 2022
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventor: Haruyuki NOMURA
  • Publication number: 20240242919
    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus a multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate. The three or more correction lenses are comprised of a first magnetic correction lens, and two or more correction lenses, the two or more correction lenses are placed inside a lens magnetic field of one of the two or more-stage objective lenses, and one or no electrostatic correction lens is placed inside a magnetic field of each of the two or more-stage objective lenses.
    Type: Application
    Filed: September 26, 2023
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventor: Hirofumi MORITA
  • Publication number: 20240242920
    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an acceleration lens comprised of an electrostatic lens including a plurality of electrodes and configured to accelerate a multi charged particle beam, two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses including a first correction lens, a second correction lens and a third correction lens, and configured to correct an imaging state of the multi charged particle beam on the substrate. One or no electrostatic correction lens is placed in a magnetic field of each of the two or more-stage objective lenses. The first correction lens is an electrostatic correction lens that also serves as at least one of the plurality of electrodes of the acceleration lens.
    Type: Application
    Filed: October 6, 2023
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventor: Hirofumi MORITA
  • Publication number: 20240242933
    Abstract: A multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the beam on a substrate, n (n?3) correction lenses correcting an imaging state of the multi charged particle beam, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied. The electric field control electrode generates an electric field between the substrate and the electrode. The objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the beam. m (n?m?1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens. (n?m) correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction.
    Type: Application
    Filed: November 15, 2023
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Hirofumi MORITA, Haruyuki NOMURA
  • Publication number: 20240242932
    Abstract: A multi-charged particle beam writing apparatus includes a distribution ratio calculation circuit to calculate, for the each control grid and each combination of combinations, a dose distribution ratio for each beam of at least two beams forming a combination concerned in order to distribute a dose amount, which is to be applied to a control grid concerned, to the at least two beams forming the combination concerned such that a total of distribution dose amounts having been distributed to the at least two beams forming the combination concerned is substantially equivalent to the dose amount to be applied to the control grid concerned, and a combination selection circuit to select, for the each control grid, a combination in which a dose distribution ratio for the first beam is larger than a dose distribution ratio for at least one beam remaining in the at least two beams forming the combination concerned.
    Type: Application
    Filed: March 29, 2024
    Publication date: July 18, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Yasuo KATO, Ryoh KAWANA, Masao HAYAMI
  • Publication number: 20240234083
    Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.
    Type: Application
    Filed: September 5, 2023
    Publication date: July 11, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Yasutaka SATO, Hironori MIZOGUCHI, Toru HINATA, Toshiki KIMURA, Kiminobu AKENO
  • Patent number: 12009174
    Abstract: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.
    Type: Grant
    Filed: February 16, 2022
    Date of Patent: June 11, 2024
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Kazuhiro Kishi, Munehiro Ogasawara
  • Patent number: 12009175
    Abstract: In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: June 11, 2024
    Assignee: NuFlare Technology, Inc.
    Inventors: Hirofumi Morita, Takanao Touya
  • Publication number: 20240186100
    Abstract: In one embodiment, a blanking aperture array system includes a blanking aperture array substrate provided blankers corresponding to each beam of a multi beam, a first radiation shield, and a second radiation shield. A circuit section applying a voltage to the blankers is disposed closer to a peripheral edge than a cell section including the blankers. The first radiation shield includes a first plate covering over the circuit section, disposed on an upper surface of the blanking aperture array substrate, and extending from a peripheral edge of a first opening for passage of the multi beam. The second radiation shield covers under the circuit section, and includes a lower peripheral wall section that hangs down from a lower surface of the blanking aperture array substrate and surrounds the cell section, and a lower plate extending from a peripheral edge of a lower opening for passage of the multi beam.
    Type: Application
    Filed: October 9, 2023
    Publication date: June 6, 2024
    Applicant: NuFlare Technology, Inc.
    Inventor: Shuji YOSHINO
  • Publication number: 20240175829
    Abstract: An image acquisition circuit is configured to acquire inspection images based on secondary electrons generated by electron beams emitted to a first area of a sample on a stage. The first area includes sub areas. An estimation circuit is configured to estimate an amount of rotation of an array of the electron beams emitted to the first area based on an amount of misalignment between reference images respectively indicative of patterns to be respectively formed in the sub areas and the inspection images. The stage control circuit is configured to control, based on the amount of rotation, a focus position of the electron beams to be emitted to a second area of the sample. The comparison circuit is configured to compare the reference images with the inspection images.
    Type: Application
    Filed: November 2, 2023
    Publication date: May 30, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Masataka SHIRATSUCHI, Riki OGAWA, Chosaku NODA
  • Patent number: 11995817
    Abstract: According to an embodiment, a defect inspection method is performed with a defect inspection apparatus. The defect inspection apparatus is adapted to irradiate a first sample with illumination light to acquire a first sample image, and compare the first sample image to a reference image to inspect a defect. The defect inspection method includes generating the reference image, acquiring the first sample image, setting a defect detection condition using an index based on a result of defect inspection of a second sample different from the first sample, and discriminating a nuisance from a result of comparison between the reference image and the first sample image based on the defect detection condition.
    Type: Grant
    Filed: December 10, 2021
    Date of Patent: May 28, 2024
    Assignee: NuFlare Technology, Inc.
    Inventor: Ryoichi Hirano
  • Publication number: 20240136148
    Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.
    Type: Application
    Filed: September 4, 2023
    Publication date: April 25, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Yasutaka SATO, Hironori MIZOGUCHI, Toru HINATA, Toshiki KIMURA, Kiminobu AKENO
  • Patent number: 11961708
    Abstract: Position shifts caused by charging phenomena can be corrected with high accuracy.
    Type: Grant
    Filed: April 21, 2021
    Date of Patent: April 16, 2024
    Assignee: NuFlare Technology, Inc.
    Inventors: Haruyuki Nomura, Noriaki Nakayamada
  • Patent number: 11961703
    Abstract: A beam arrangement portion is provided to arrange multiple primary electron beams on a substrate. The beam arrangement portion arranges the multiple primary electron beams in a square lattice along a first moving direction of a stage allowing the substrate to be placed thereon and a second moving direction perpendicular to the first moving direction in a state where, when the multiple primary electron beams are viewed as a whole, beams around four corners of the square lattice are omitted.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: April 16, 2024
    Assignee: NuFlare Technology, Inc.
    Inventor: Chosaku Noda
  • Patent number: 11942305
    Abstract: In one embodiment, a data generation method includes generating a plurality of parametric elements by dividing, at positions of an extremum and an inflection point, a parametric curve that expresses a shape of a writing pattern and is defined by a plurality of control points arranged in order in a predetermined direction, generating a polygon by extracting, for each of the parametric elements, one or some of the plurality of control points and connecting the extracted control points in order in the predetermined direction, calculating a coverage by the polygon in each of a plurality of rectangular segmented regions obtained by dividing a target to be irradiated with a charged particle beam into a predetermined size, and calculating a coverage of each segmented region in a peripheral part of the writing pattern by finding intersections of each of the plurality of parametric elements and four sides of each of the plurality of segmented regions.
    Type: Grant
    Filed: June 20, 2022
    Date of Patent: March 26, 2024
    Assignee: NuFlare Technology, Inc.
    Inventor: Kenichi Yasui
  • Publication number: 20240096590
    Abstract: In one embodiment, a length measurer includes a first laser interferometer provided in a wall surface of the writing chamber, synthesizes a laser beam with the first frequency which has traveled back and forth between the first laser interferometer and the stage and a laser beam with the second frequency reflected in the first laser interferometer, and outputs a first beat signal. A wall surface displacement measurer includes a second laser interferometer provided in the wall surface of the writing chamber, synthesizes a laser beam with the first frequency which has traveled back and forth between the second laser interferometer and a fixed mirror and a laser beam with the second frequency reflected in the second laser interferometer, and outputs a second beat signal. The position of the stage is calculated based on a difference between the first beat signal and the second beat signal.
    Type: Application
    Filed: September 1, 2023
    Publication date: March 21, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Yasutaka SATO, Yuto ASAKURA
  • Publication number: 20240087845
    Abstract: An electron beam writing apparatus according to the present invention includes a potential regulating member arranged to be upstream of a target object in the case where the target object is placed on a stage, and configured to be set to have a fixed potential being positive with respect to the target object, a potential applying circuit configured to apply a voltage to the target object or the potential regulating member so that the potential regulating member has the fixed potential, and a correction circuit configured to correct a positional deviation of the electron beam on a surface of the target object which occurs in the case where the target object is irradiated with the electron beam in the state in which the potential regulating member has the fixed potential.
    Type: Application
    Filed: July 20, 2023
    Publication date: March 14, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Haruyuki NOMURA, Hirofumi MORITA
  • Publication number: 20240079200
    Abstract: A multi-electron beam image acquiring apparatus includes a stage configured to mount thereon a substrate, an illumination optical system configured to apply multiple primary electron beams to the substrate, a plurality of multipole lenses including at least two stages of multipole lenses, arranged at positions common to a trajectory of the multiple primary electron beams and a trajectory of multiple secondary electron beams which are emitted because the substrate is irradiated with the multiple primary electron beams and each configured to include at least four electrodes and at least four magnetic poles, and a multi-detector configured to detect the multiple secondary electron beams separated from the trajectory of the multiple primary electron beams, wherein one of the plurality of multipole lenses separates the multiple secondary electron beams from the trajectory of the multiple primary electron beams.
    Type: Application
    Filed: November 9, 2023
    Publication date: March 7, 2024
    Applicant: NuFlare Technology, Inc.
    Inventors: Kazuhiko INOUE, Atsushi ANDO, Munehiro OGASAWARA
  • Patent number: D1016761
    Type: Grant
    Filed: June 10, 2021
    Date of Patent: March 5, 2024
    Assignee: NuFlare Technology, Inc.
    Inventors: Takuto Umetsu, Masayoshi Yajima, Kunihiko Suzuki