Abstract: The invention relates to an imprint apparatus for carrying out a two-step process for transferring a pattern from a template to a target surface of a substrate. The apparatus works by creating an intermediate disc, e.g. from a flexible polymer stamp, by imprint from the template in a first imprint unit. A feeder device is then operated to feed the intermediate stamp to a second imprint unit, where it is used to make an imprint in a target surface of a substrate.

Abstract: An apparatus and method are provided for separating two objects attached to each other in a sandwich structure, such as a stamp and a substrate pressed together in an imprint process. The apparatus includes a support structure, carrying first fastening means having a base surface and first gripping means for supporting and holding a first object, second fastening means, positioned opposite to the first fastening means, having second gripping means for holding a second object, and a pulling force mechanism to provide a pulling force at an angle to the normal direction of the base surface for displacing the two fastening means away from each other. Preferably, the second object is gripped at a periphery portion, and the pulling force is angled inwardly from said periphery portion.

Abstract: The present invention relates to a nano imprint method and to a nano imprint apparatus comprising: a first imprint module, a second imprint module, a storage and a feeder module, wherein; the first imprint module is adapted to imprint a pattern into an intermediate polymer stamp from a template; a second imprint module is adapted to imprint a pattern into a substrate from the intermediate polymer stamp; robot feeder modules are adapted to move the template, intermediate polymer stamp and the substrate from and to storages.

Abstract: A method and device for forming an optical or magnetic memory medium or a template for making such memory media, including suspending an essentially flat substrate rotatably about an axis, arranging a particle beam source to expose the surface layer to a particle beam, rotating the substrate such that the particle beam forms a groove in the surface layer by exposure to a predetermined degree, which groove has a width on the order of 1-100 nm, and controlling the position of the particle beam and the axis relative to each other, during rotation of the substrate about the axis so that part of the groove is subjected to more than one exposure to the particle beam, whereby the groove is formed as a sum of said more than one exposure, which sum corresponds to said predetermined degree of exposure.

Abstract: There is provided a device for transferring a pattern from a stamp to a substrate, provided with a moldable film, by pressing the stamp and the substrate against each other. The device comprises at least one fixture for retaining a planar object such as the stamp or the substrate. The device is distinguished in that it comprises a heating element for heating the planar object, and measuring arrangement for determining a change in the size of the planar object due to the heating.

Abstract: Device in connection with the lithography of structures of nanometer size, which device comprises a first main part (1) with a first principally plane surface (2a) and a second main part (3) with a second principally plane surface (9a), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate (5) and a template (10) respectively, or vice-versa. According to the invention, said second main part (3) also comprises a cavity (6) for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (9), of which one side, which side faces away from the cavity (6), forms said second surface (9a). The invention also relates to a method that utilizes the device.

Abstract: A device is provided for transferring a pattern to an object. The device may be used for transferring a pattern, such as micro- or nanostructures, from a stamp to an object. In accordance with one embodiment, the device comprises a first contacting means with a receiving surface for the stamp and a second contacting means with a receiving surface for the object. The device may further include a pressing means that is adapted to operate at least one of the contacting means for contacting the stamp with the object. One of the contacting means may include a base and a holder. The holder has a first end which defines one of the receiving surfaces and a second opposite end which is pivotally connected to the base in such a manner that the stamp and the object are automatically placed in a parallel position when contacting each other.

Abstract: An imprint process comprises the step of aligning a substrate, supported on a first support member, with a template, supported on a second support member. The substrate has at least one essentially plane surface provided with a moldable film. The template has at least one essentially plane surface provided with a relief pattern. The relief pattern is adapted to interact with the moldable film. The process further comprises the step of arranging a sealing gasket between the template and the second support member, such that a pressure cavity is defined by the second support member, the template and the sealing gasket. The process also comprises the step of applying a static gas pressure to the pressure cavity, in order to provide a pressure between the template and the substrate. The pressure is sufficient to form a pattern in the moldable film. An imprint device is also disclosed.

Abstract: A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain.

Abstract: A method and a device for forming at least a first pattern on a substrate (6,28), which is coated with a layer (5) on at least a first planar surface, are described. According to the method, a first pressing means (27) is arranged with a first structure (32) that defines the pattern, and the substrate (28) is arranged so that the first pressing means (27) is separated from the substrate (28) and so that the first pressing means (27) and the substrate (28) are unable to move transversely of the common center line (50) but are able to move freely in a direction along the center line (50).

Abstract: A device (4) for transferring a pattern to an object (2). The invention relates especially to production of micro and nanostructures. The device comprises an alignment means (10) arranged in connection with a first contacting means (7) for controlling the motion of the first stamp (8) in a direction perpendicular to the pressing direction (A), and a second contacting means (11) having a second stamp (12) adapted to imprint a second pattern in the second surface (6) of the object (2), and a pressing means (9) further adapted to press the second stamp (12) into contact with the second surface (6) of the object (2) in the pressing direction (A). Hereby is obtained a device of a simple design, which has a high accuracy of the alignment of the stamps in relation to the object.

Abstract: A method for manufacturing a resistor function in an electric conductor on the surface of a carrier, preferably a conductor on printed circuit boards, substrates and chips. By etching using an anisotropic etching technique, the conductor is provided with at least one portion which has a smaller cross-sectional area than the conductor surrounding the portion, the length and width of the portion being such that a predetermined resistance is obtained in the conductor. A resistor according to the invention is on both sides connected to a conductor on a carrier, such as a printed circuit board, a substrate or a chip. The resistor comprises a conductor portion positioned on the carrier and having a significantly smaller cross-sectional area than the conductor on both sides of the resistor.

Abstract: A method of making, by etching, depressions in selected portions of an etching surface of an electrically conductive etching material, the depressions forming an etching pattern, comprises the step of contacting the etching material with an etchant. A passivating layer is formed on the etching material which layer decreases or stops the etching capability of the etchant on the surface and which is dissolved in a chemical reaction when exposed to electromagnetic radiation. An electrode with electrically conductive electrode portions in selected portions of an electrode surface is provided, the electrode portions forming an electrode pattern corresponding to the etching pattern. The electrode is arranged in contact with the etchant and with the electrode portions facing the etching surface of the etching material, an electric voltage is applied between the electrode and the etching material, and the etching material is exposed to electromagnetic radiation essentially perpendicular to the etching surface.

Abstract: An electronics device comprising a carrier, such as a printed circuit board, a substrate or a chip, and an electric conductor on a surface of the carrier. The surface of the conductor (2) facing away from the carrier has a surface structure (3, 4; 6, 7) in the form of flanges which are defined by etched grooves.

Abstract: A method for plating an electrically conductive substance, which includes the steps of contacting the electrically conductive substance with a plating agent in dilute solution, in which the plating agent is present in a concentration of 200 mM at most, and subjecting the plating agent adjacent to the electrically conducive substance to an electric field.

Abstract: In a method for anisotropic etching of a structure in an electrically conductive substance to be etched, use is made of an etchant which in concentrated solution is usable for isotopic etching of structures in the substance to be etched. The substance to be etched is contacted with the etchant in a solution which is so diluted that the etchant is unusable for isotropic etching. The etchant is subjected, adjacent to the substance to be etched, to an electric field of such a strength that anisotropic etching of the substance to be etched is accomplished. Moreover, an etching fluid is described, comprising an etchant in dilute solution, in which the etchant is present in a concentration of 200 mM at most, and use of such an etching fluid for making structures which are 50 &mgr;m or less is also described.

Abstract: A method of encrypting and decrypting digital data such as text, numeric, images, pictures, especially tailored for optical compact discs; said method comprising of ciphering/deciphering and error detection and correction using algebraic method, namely Reed-Solomon code.