Patents Assigned to ODP Co., Ltd.
  • Surface pattern unevenness detecting method and apparatus
    Patent number: 5991038
    Abstract: The present invention provides an apparatus and associated method of detecting pattern unevenness in the surface of an object. The apparatus includes a light source for irradiating surfaces of an object and a line sensor camera for detecting unevenness in the surfaces. The method comprises the steps of irradiating a light onto a surface having a pattern formed on the surface thereof, and observing the scattered light from the pattern edge portions, thereby inspecting pattern unevenness by way of the line sensor camera.
    Type: Grant
    Filed: July 15, 1998
    Date of Patent: November 23, 1999
    Assignee: ODP Co., Ltd.
    Inventor: Shigeru Yamamoto