Patents Assigned to OEM Group, LLC
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Publication number: 20240167144Abstract: The present invention provides a method for in-situ etching of a wafer prior to sputter deposition, the method comprising the following steps. A sputtering chamber having a sputtering target is provided. The wafer is placed into the sputtering chamber. A gas is introduced into the sputtering chamber such that the gas at least partially ionized as a plasma, wherein the plasma includes positively charged gas ions. A first negative potential is applied to the wafer while a second negative potential is simultaneously applied to the sputtering target and while no shutter is positioned between the wafer and the sputtering target.Type: ApplicationFiled: January 30, 2024Publication date: May 23, 2024Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang
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Patent number: 11615947Abstract: The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.Type: GrantFiled: August 20, 2021Date of Patent: March 28, 2023Assignee: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra, William W. Senseman
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Publication number: 20220162737Abstract: The present invention provides a method for in-situ etching of a wafer prior to physical vapor deposition, the method comprising the following steps. A sputtering chamber is provided, the sputtering chamber being collectively defined by a wafer handling apparatus and a magnetron. The wafer is placed into the sputtering chamber. A gas is introduced into the sputtering chamber such that the gas is separated into a plasma, wherein the plasma includes gas ions. A first negative potential is applied to the wafer using a wafer chuck of the wafer handling apparatus while a second negative potential is simultaneously applied to a sputtering target of the magnetron, wherein simultaneous application of the first negative potential to the wafer and the second negative potential to the sputtering target causes gas ions to eject material from the wafer and the sputtering target of the magnetron such that ejected material from the wafer and the sputtering target is collected onto a shield defined by the sputtering chamber.Type: ApplicationFiled: November 2, 2021Publication date: May 26, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang
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Publication number: 20220122815Abstract: The present invention provides a method for depositing an ultra-thin film onto a wafer. The method comprising the following steps. A sputtering chamber is provided wherein the sputtering chamber is collectively defined by a wafer handling apparatus and a magnetron. The wafer is placed onto a wafer chuck of the wafer handling apparatus. The wafer chuck is moved to a first distance to the magnetron. A gas is introduced into the sputtering chamber such that the gas is separated into a plasma, wherein the plasma includes gas ions. A first negative potential is applied to at least one sputtering target of the magnetron while the wafer chuck with the wafer is at the first distance to the magnetron. The wafer chuck is moved to a second distance to the magnetron. A second negative potential is applied to at least one sputtering target of the magnetron while the wafer chuck with the wafer is at the second distance to the magnetron.Type: ApplicationFiled: September 28, 2021Publication date: April 21, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang
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Publication number: 20220068619Abstract: The present invention provides a magnetron system comprising a baseplate assembly that defines a housing portion and a power feedthrough. A magnet assembly and a segmented target assembly are disposed within the housing portion. The segmented target assembly has an inner target segment having a plurality of target tiles. A plurality of electrical contacts are in electrical communication with the power feedthrough, wherein each electrical contact of the plurality of electrical contacts electrically contacts a respective target tile of the plurality of target tiles such that power is delivered from each electrical contact of the plurality of electrical contacts to each respective target tile of the plurality of target tiles.Type: ApplicationFiled: July 29, 2021Publication date: March 3, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra
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Publication number: 20220068620Abstract: The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.Type: ApplicationFiled: August 20, 2021Publication date: March 3, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra, William W. Senseman
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Publication number: 20210054497Abstract: Various embodiments of a mechanical assembly for linear and rotational handling of electronic wafer substrates under high vacuum are disclosed herein.Type: ApplicationFiled: August 19, 2020Publication date: February 25, 2021Applicant: OEM Group, LLCInventors: Marc A. Lariviere, Brendan V. Trang, Michael S. Correra, Christian K. Forgey, Juan M. Rios Reyes
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Patent number: 10777434Abstract: Various embodiments of a spray measurement system having a jig device that allows measuring spray output of one or more spray nozzles and determine spray distribution patterns of the spray nozzles are disclosed.Type: GrantFiled: July 8, 2019Date of Patent: September 15, 2020Assignee: OEM Group, LLCInventors: Darren O'Reilly, Christian Forgey, Joshua Levinson, Jeff Garbacik, Alexander Trufanov, Robert Kraiger, David Brady
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Publication number: 20200258763Abstract: Various embodiments of a spray measurement system having a jig device that allows measuring spray output of one or more spray nozzles and determine spray distribution patterns of the spray nozzles are disclosed.Type: ApplicationFiled: April 29, 2020Publication date: August 13, 2020Applicant: OEM Group, LLCInventors: Darren O'Reilly, Christian Forgey, Joshua Levinson, Jeff Garbacik, Alexander Trufanov, Robert Kraiger, David Brady
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Publication number: 20200238308Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: ApplicationFiled: January 28, 2020Publication date: July 30, 2020Applicant: OEM Group, LLCInventors: Christian K. Forgey, Alexander Trufanov, Joshua A. Levinson, Darren O. O'Reilly
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Publication number: 20200013650Abstract: Various embodiments of a spray measurement system having a jig device that allows measuring spray output of one or more spray nozzles and determine spray distribution patterns of the spray nozzles are disclosed.Type: ApplicationFiled: July 8, 2019Publication date: January 9, 2020Applicant: OEM Group, LLCInventors: Darren O'Reilly, Christian Forgey, Joshua Levinson, Jeff Garbacik, Alexander Trufanov, Robert Kraiger, David Brady