Abstract: Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.

Abstract: The invention relates to an arc source with a target (1) having a target front face (2) for the vacuum vaporization of the target material, a target backside with a cooling plate (4), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration (8, 9) with an inner magnet system (8) and/or an outer magnet system (9) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems (8) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face (2).

Abstract: Discs (7) arranged along a shaft and having holders (8) distributed over the circumference, inclined outwards and intended for workpieces are supported on a ring (5) surrounding the discs (7). Successive rings (5) form an approximately cylindrical cladding which prevents undesired coating of the discs (7). Cladding has openings for the holders (8) of a disc (7) which are uniformly distributed over the circumference at the same height, each formed by an upper recess (14) in the ring (5) carrying the disc (7) and an adjacent lower recess (15) of the following ring. Boundary lines (17) between successive rings (5) start somewhat below the narrowest points of the webs separating adjacent openings, so that the lower recesses (15) do not narrow towards the edge of the ring (5) and the upper recesses (14) narrow at most slightly so that the workpiece carrier can be assembled from bottom to top.

Abstract: The present invention relates to a multilayer coating system deposited on at least a portion of a solid body surface and containing in the multilayer architecture Al—Cr—B—N individual layers deposited by means of a physical vapor deposition method characterized in that in at least a portion of the overall thickness of the multilayer coating system the Al—Cr—B—N individual layers are combined with Ti—Al—N individual layers, wherein the Al—Cr—B—N and Ti—Al—N individual layers are deposited alternately one on each other, and wherein the thickness of the Al—Cr—B—N individual layers is thicker than the thickness of the Ti—Al—N individual layers, and thereby the residual stress of the multilayer coating system is considerably lower in comparison to the residual stress of the corresponding analogical Al—Cr—B—N monolayer coating.

Abstract: Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

Abstract: The invention relates to a method for using a target for a coating process of metal oxide and/or metal nitride coatings by means of spark evaporation, wherein the target can be operated at a temperature that is higher than the melting point of the metal used in the target, and wherein the target is comprised of a metal whose oxides and/or nitrides are not electrically conducting. The invention further relates to the use of a target for producing metal oxide coatings and/or metal nitride coatings by means of spark evaporation, wherein the target has a matrix comprised of a metal, in which matrix non electrically conducting oxides and/or nitrides of the metal are embedded.

Abstract: The present invention relates to a pretreatment method to be applied to secondary surfaces in coating systems prior to coating. To this end, a non-stick coating is applied to the secondary surfaces, which can be easily detached from the secondary surfaces, even after coating material has been deposited thereon. In this way, the cleaning process of the coating system after the coating process is considerably simplified.

Abstract: Method for performing a HIPIMS coating process, whereby a minimal distance 5 between target and substrate is reduced till achieving an essentially maximal bias current at substrate during coating process, and thereby improving considerably coating quality and increasing deposition rate in comparison with conventional HIPIMS coating processes.

Abstract: A sealable volume has a wall forming at least a portion of a boundary limiting the volume. The wall includes a hydrogen permeation barrier including a layer system (LS) having at least one layer. The layer system includes at least one hydrogen barrier layer (HPBL) of an at least ternary oxide. Preferably, the oxide is substantially composed of Al, Cr and O and the hydrogen barrier layer (HPBL) is deposited using physical vapor deposition, in particular cathodic arc evaporation. Preferably, the layer system includes at least one of: an adhesion layer (AdhL), a hydrogen storage layer (HStL), a protective layer (ProtL), in particular a thermal barrier layer (ThBL), a diffusion barrier layer (DBL), an oxidation barrier layer (OxBL), a chemical barrier layer (ChBL), a wear resistance layer (WRL). Excellent hydrogen permeation barrier properties can be achieved, and the layer system can be tailored as required by an envisaged application.

Abstract: Discs (7) arranged along a shaft and having holders (8) distributed over the circumference, inclined outwards and intended for workpieces are supported on a ring (5) surrounding the discs (7). Successive rings (5) form an approximately cylindrical cladding which prevents undesired coating of the discs (7). Cladding has openings for the holders (8) of a disc (7) which are uniformly distributed over the circumference at the same height, each formed by an upper recess (14) in the ring (5) carrying the disc (7) and an adjacent lower recess (15) of the following ring. Boundary lines (17) between successive rings (5) start somewhat below the narrowest points of the webs separating adjacent openings, so that the lower recesses (15) do not narrow towards the edge of the ring (5) and the upper recesses (14) narrow at most slightly so that the workpiece carrier can be assembled from bottom to top.

Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

Abstract: The method for manufacturing a hydrogen permeation barrier comprises the steps of a) depositing on a substrate (SUB) a layer system (LS) comprising at least one layer (L1,L2,L3); characterized in that step a) comprises the step of b) depositing at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. The apparatus comprises a sealable volume and a wall forming at least a portion of a boundary limiting said volume, wherein said wall comprises a hydrogen permeation barrier comprising a layer system (LS) comprising at least one layer, wherein said layer system comprises at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. Preferably, said at least ternary oxide is substantially composed of Al, Cr and O, and said depositing said at least one hydrogen barrier layer (HPBL) is carried out using a physical vapor deposition method, in particular a cathodic arc evaporation method.

Abstract: Vacuum treatment installation particularly for plasma coating workpieces has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma.

Abstract: In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zircon and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, combined with the use of the mixed target, nitrogen can also be used as the reactive gas in addition to oxygen.

Abstract: The present invention relates to a multilayer coating system deposited on at least a portion of a solid body surface and containing in the multilayer architecture Al—Cr—B—N individual layers deposited by means of a physical vapour deposition method characterized in that in at least a portion of the overall thickness of the multilayer coating system the Al—Cr—B—N individual layers are combined with Ti—Al—N individual layers, wherein the Al—Cr—B—N and Ti—Al—N individual layers are deposited alternately one on each other, and wherein the thickness of the Al—Cr—B—N individual layers is thicker than the thickness of the Ti—Al—N individual layers, and thereby the residual stress of the multilayer coating system is considerably lower in comparison to the residual stress of the corresponding analogical Al—Cr—B—N monolayer coating.

Abstract: Vacuum treatment installation particularly for plasma coating workpieces has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma.

Abstract: A workpiece has a body (3) and a wear-resistant hard coating system (HLo), which system comprises a layer of the following composition: (Al1-a-b-cCraBbZc)X where X is at least one of: N, C, CN, NO, CO, CNO; Z is at least one of: W, Mo, Ta, Cb (Nb). For a, b and c specific ranges of values are valid.

Abstract: Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier.

Abstract: A workpiece has a body (3) and a wear-resistant hard coating system (HLo), which system comprises a layer of the following composition: (Al1-a-b-cCraBbZc)X where X is at least one of: N, C, CN, NO, CO, CNO; Z is at least one of: W, Mo, Ta, Cb (Nb). For a, b and c specific ranges of values are valid.

Abstract: A saw band of steel for a band saw machine with a band back (Br) and with a tooth row arranged thereon having several teeth (20), wherein the initial tooth form (10) is triangular with a tooth base with tooth width (b) and with the tooth tip (1) with a first tooth height (h1), such that the tooth tip (1) does not project beyond tooth width (b) in the band running direction (L), wherein the lateral side of the triangle located in front in the running direction (L) forms the rake face (2) and the rear lateral side forms the clearance face (3) of the tooth (10, 20). The tooth tip (1) of the triangle is specifically removed for the development of a rounded-off tooth crest (4) with a reduced second tooth height (h2), wherein at least in the proximity of the tooth crest (4) a hard material coating covers at least partially the cutting face formed of the tooth crest (4), the rake face (2) and the clearance face (3).