Patents Assigned to Olin Microelectronic Chemicals
  • Cleaning composition and method for removing residues
    Patent number: 6030932
    Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: February 29, 2000
    Assignee: Olin Microelectronic Chemicals
    Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery
  • Aqueous rinsing composition
    Patent number: 5977041
    Abstract: The present invention is directed to an aqueous post-strip rinsing composition, comprising (1) water; (2) at least one water-soluble organic acid; and (3) at least one water-soluble surface-active agent, the rinse solution having a pH in the range from about 2.0 to about 5.0. The present invention is also directed to a method of using the above composition to remove residues from a semiconductor substrate.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: November 2, 1999
    Assignee: Olin Microelectronic Chemicals
    Inventor: Kenji Honda