Abstract: At least one polisher is provided that has a rotation axis that is parallel to a normal to a surface of material to be polished, which is mounted on a table. The polisher moves relative to the material to polish and process the surface of the material. The polisher has a structure such that as the polisher polishes the surface of the material an amount of polishing of the material in an outer region of the polisher, which is located away from the rotation axis of the polisher, is smaller than that at the rotation axis.
© 2024 Justia
