Patents Assigned to ONECHANGMATERIAL CO., LTD.
  • Patent number: 11401633
    Abstract: A seamless double-woven fabric for filling down includes a first fabric layer including first warps and first wefts, a second fabric layer including second warps and second wefts, and a coupling part to partition a down filling part formed between the first and second fabric layers into down filling spaces. The first warp and the second warp are formed so as to be crossed to each other one time or at least two times through a coupling weft. If the number of the coupling wefts is 2n, wherein n is an integer of 1 or more, the first and second fabric layers are arranged to be crossed about the coupling part. If the number of the coupling wefts is 2n+1, wherein n is an integer of 0 or more, the first and second fabric layers are arranged not to be crossed.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: August 2, 2022
    Assignee: ONECHANGMATERIAL CO., LTD.
    Inventors: Ku Gen You, Young Baek Chae