Patents Assigned to Ontos Equipment Systems
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Patent number: 11651942Abstract: An atmospheric pressure plasma system includes an atmospheric pressure plasma source that generates a glow discharge-type plasma. The atmospheric pressure plasma source comprises a plasma head and a gas sensor system. The plasma head includes a gas inlet, a gas passage surrounded by a dielectric liner, a radio frequency (RF) electrode and a ground electrode. The RF electrode and the ground electrode are arranged at opposite sides of an outer surface of a segment of the gas passage. The gas sensor system comprises a first pellistor that is exposed to a process gas entering the gas inlet and provides real-time monitoring of the presence and concentration of helium in the process gas entering the gas inlet during plasma operation.Type: GrantFiled: December 11, 2020Date of Patent: May 16, 2023Assignee: Ontos Equipment Systems, Inc.Inventors: Robert Emmett Hughlett, Daniel Pascual, David Meyer, Michael Dow Stead
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Publication number: 20210193442Abstract: An atmospheric pressure plasma system includes an atmospheric pressure plasma source that generates a glow discharge-type plasma. The atmospheric pressure plasma source comprises a plasma head and a gas sensor system. The plasma head includes a gas inlet, a gas passage surrounded by a dielectric liner, a radio frequency (RF) electrode and a ground electrode. The RF electrode and the ground electrode are arranged at opposite sides of an outer surface of a segment of the gas passage. The gas sensor system comprises a first pellistor that is exposed to a process gas entering the gas inlet and provides real-time monitoring of the presence and concentration of helium in the process gas entering the gas inlet during plasma operation.Type: ApplicationFiled: December 11, 2020Publication date: June 24, 2021Applicant: Ontos Equipment Systems, Inc.Inventors: ROBERT EMMETT HUGHLETT, DANIEL PASCUAL, DAVID MEYER, MICHAEL DOW STEAD
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Patent number: 10985024Abstract: Methods and systems for using the downstream active residuals of a reducing-chemistry atmospheric plasma to provide multiple advantages to pre-plating surface preparation with a simple apparatus. As the downstream active species of the atmospheric plasma impinge the substrate surface, three important surface preparation processes can be performed simultaneously: 1. Organic residue is removed from the surface of the plating base. 2. Oxidation is removed from the surface of the plating base. 3. All surfaces on the substrate are highly activated by the downstream active residuals thus creating a highly wettable surface for subsequent plating operations.Type: GrantFiled: August 27, 2019Date of Patent: April 20, 2021Assignee: ONTOS Equipment Systems, Inc.Inventor: Eric Frank Schulte
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Publication number: 20200234958Abstract: Methods and systems for using the downstream active residuals of a reducing-chemistry atmospheric plasma to provide multiple advantages to pre-plating surface preparation with a simple apparatus. As the downstream active species of the atmospheric plasma impinge the substrate surface, three important surface preparation processes can be performed simultaneously: 1. Organic residue is removed from the surface of the plating base. 2. Oxidation is removed from the surface of the plating base. 3. All surfaces on the substrate are highly activated by the downstream active residuals thus creating a highly wettable surface for subsequent plating operations.Type: ApplicationFiled: August 27, 2019Publication date: July 23, 2020Applicant: Ontos Equipment SystemsInventor: Eric Frank Schulte
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Patent number: 10672594Abstract: An atmospheric pressure plasma system includes an atmospheric pressure plasma source that generates a glow discharge-type plasma. The atmospheric pressure plasma source comprises a plasma head, a heating element and an active cooling element and the heating element and active cooling element control the plasma head temperature to a set-point temperature independent of variations in plasma generating power or plasma power ON/OFF status.Type: GrantFiled: October 30, 2017Date of Patent: June 2, 2020Assignee: ONTOS EQUIPMENT SYSTEMS, INC.Inventors: Robert Emmett Hughlett, Matthew Sheldon Phillips, Eric Frank Schulte, Michael Dow Stead
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Patent number: 10438804Abstract: Methods and systems for using the downstream active residuals of a reducing-chemistry atmospheric plasma to provide multiple advantages to pre-plating surface preparation with a simple apparatus. As the downstream active species of the atmospheric plasma impinge the substrate surface, three important surface preparation processes can be performed simultaneously: 1. Organic residue is removed from the surface of the plating base. 2. Oxidation is removed from the surface of the plating base. 3. All surfaces on the substrate are highly activated by the downstream active residuals thus creating a highly wettable surface for subsequent plating operations.Type: GrantFiled: November 12, 2015Date of Patent: October 8, 2019Assignee: Ontos Equipment SystemsInventor: Eric Frank Schulte
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Publication number: 20190088451Abstract: Methods and systems for thermal management methods to control the rates of chemical reaction at the surface of a substrate being treated by atmospheric plasma. Integrated thermal management includes static heating and cooling of the plasma head and the substrate, as well as dynamic heating and cooling of the substrate surface, before and after the substrate passes the linear aperture of the atmospheric plasma head.Type: ApplicationFiled: May 14, 2018Publication date: March 21, 2019Applicant: ONTOS Equipment Systems, Inc.Inventors: Eric Frank Schulte, Robert Emmett Hughlett, Michael Dow Stead, Joel Alfred Penelon, Matthew Sheldon Phillips, Daniel Nicholas Pascual
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Publication number: 20190062944Abstract: After CMP and before an epitaxial growth step, the substrate is prepared by an atmospheric plasma which includes not only a reducing chemistry, but also metastable states of a chemically inert carrier gas. This removes residues, oxides, and/or contaminants. Optionally, nitrogen passivation is also performed under atmospheric conditions, to passivate the substrate surface for later epitaxial growth.Type: ApplicationFiled: February 14, 2018Publication date: February 28, 2019Applicant: ONTOS Equipment Systems, Inc.Inventor: Eric Frank Schulte
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Publication number: 20180122624Abstract: An atmospheric pressure plasma system includes an atmospheric pressure plasma source that generates a glow discharge-type plasma. The atmospheric pressure plasma source comprises a plasma head, a heating element and an active cooling element and the heating element and active cooling element control the plasma head temperature to a set-point temperature independent of variations in plasma generating power or plasma power ON/OFF status.Type: ApplicationFiled: October 30, 2017Publication date: May 3, 2018Applicant: Ontos Equipment Systems, Inc.Inventors: Robert Emmett HUGHLETT, Matthew Sheldon PHILLIPS, Eric Frank SCHULTE, Michael Dow STEAD
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Patent number: 9909232Abstract: After CMP and before an epitaxial growth step, the substrate is prepared by an atmospheric plasma which includes not only a reducing chemistry, but also metastable states of a chemically inert carrier gas. This removes residues, oxides, and/or contaminants. Optionally, nitrogen passivation is also performed under atmospheric conditions, to passivate the substrate surface for later epitaxial growth.Type: GrantFiled: August 17, 2016Date of Patent: March 6, 2018Assignee: Ontos Equipment Systems, Inc.Inventor: Eric Frank Schulte
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Publication number: 20170051431Abstract: After CMP and before an epitaxial growth step, the substrate is prepared by an atmospheric plasma which includes not only a reducing chemistry, but also metastable states of a chemically inert carrier gas. This removes residues, oxides, and/or contaminants. Optionally, nitrogen passivation is also performed under atmospheric conditions, to passivate the substrate surface for later epitaxial growth.Type: ApplicationFiled: August 17, 2016Publication date: February 23, 2017Applicant: ONTOS Equipment Systems, Inc.Inventor: Eric Frank Schulte
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Publication number: 20140102594Abstract: A method of removing oxidation from certain metallic contact surfaces utilizing a combination of relatively simple and inexpensive off-the-shelf equipment and specific chemistry. The method being a very rapid dry process which does not require a vacuum or containment chamber, or toxic gasses/chemicals, and does not damage sensitive electronic circuits or components. Additionally, the process creates a passivation layer on the surface of the metallic contact which inhibits further oxidation while allowing rapid and complete bonding, even many hours after surface treatment, without having to remove the passivation layer. The process utilizes a room-ambient plasma applicator with hydrogen, nitrogen, and inert gasses.Type: ApplicationFiled: October 14, 2013Publication date: April 17, 2014Applicant: Ontos Equipment Systems, Inc.Inventor: Eric Frank Schulte
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Patent number: 8567658Abstract: A method of removing oxidation from certain metallic contact surfaces utilizing a combination of relatively simple and inexpensive off-the-shelf equipment and specific chemistry. The method being a very rapid dry process which does not require a vacuum or containment chamber, or toxic gasses/chemicals, and does not damage sensitive electronic circuits or components. Additionally, the process creates a passivation layer on the surface of the metallic contact which inhibits further oxidation while allowing rapid and complete bonding, even many hours after surface treatment, without having to remove the passivation layer. The process utilizes a room-ambient plasma applicator with hydrogen, nitrogen, and inert gasses.Type: GrantFiled: July 16, 2010Date of Patent: October 29, 2013Assignee: Ontos Equipment Systems, Inc.Inventor: Eric Frank Schulte