Patents Assigned to OnWafer Technologies, Inc.
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Patent number: 7299148Abstract: This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.Type: GrantFiled: July 8, 2005Date of Patent: November 20, 2007Assignee: OnWafer Technologies, Inc.Inventors: Dean Hunt, Costas J. Spanos, Michael Welch, Kameshwar Poolla, Mason L. Freed
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Patent number: 7282889Abstract: Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.Type: GrantFiled: July 10, 2004Date of Patent: October 16, 2007Assignee: OnWafer Technologies, Inc.Inventors: Mason L. Freed, Randall S. Mundt, Costas J. Spanos
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Patent number: 7212950Abstract: Computer program products, methods, systems, and apparatus for fingerprinting and process matching process tools such as process tools used for processing workpieces are described. One embodiment includes a method to determine process matching of one or more process tools using a first data set and a second data set. The first data set and the second data set include an operating characteristic for a process. The method comprises fingerprinting the one or more process tools using the first data set and the second data set; finding correspondences between transition points in the first data set and the second data set; and comparing the first data set and second data set using the correspondences to determine whether the first data set and the second data set match so as to indicate whether the one or more process tools match.Type: GrantFiled: September 17, 2003Date of Patent: May 1, 2007Assignee: OnWafer Technologies, Inc.Inventor: Kameshwar Poolla
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Patent number: 7016754Abstract: Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.Type: GrantFiled: September 26, 2003Date of Patent: March 21, 2006Assignee: OnWafer Technologies, Inc.Inventors: Kameshwar Poolla, Costas J. Spanos
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Patent number: 6907364Abstract: Presented are methods, systems, and apparatus for deriving heat flux information and using heat flux information for a workpiece used in temperature sensitive processes.Type: GrantFiled: September 16, 2003Date of Patent: June 14, 2005Assignee: OnWafer Technologies, Inc.Inventors: Kameshwar Poolla, Randall S. Mundt
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Patent number: 6789034Abstract: Information transfer is effected using a network of electrical signal conductors and sensors forming crosspoint connections. The sensors are capable of representing a measurement parameter as an electrical impedance. One embodiment of the present invention includes output electrical conductors, input electrical conductors, and sensors. Each of the sensors is connected with one of the output electrical conductors and one of the input electrical conductors so as to form an array of crosspoint connections. Application of electrical signals to the sensors and measurement of electrical signals from the sensors provide sufficient information to derive relative information corrected for parasitic current sources for each sensor using algorithms based on equations for combining impedance. The embodiment may further include one or more reference elements connected with the output electrical conductors and with the input electrical conductors so as to form crosspoint connections.Type: GrantFiled: April 19, 2002Date of Patent: September 7, 2004Assignee: OnWafer Technologies, Inc.Inventor: Mason L. Freed
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Patent number: 6741945Abstract: Described are methods and apparatus for collecting measured parameter data for applications such as deriving response models and information required for developing and maintaining processes and process tools. The methods and apparatus are capable of deriving correction factors for the measured data and applying the corrections factors to the measure data so as to provide corrected parameter data having increased accuracy. One embodiment uses warpage geometry to derive the correction factors.Type: GrantFiled: April 19, 2002Date of Patent: May 25, 2004Assignee: OnWafer Technologies, Inc.Inventors: Kameshwar Polla, Costas J. Spanos
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Patent number: 6738722Abstract: Described are methods and apparatus for collecting measured parameter data for applications such as deriving response models and information required for developing and maintaining processes and process tools. The methods and apparatus are capable of deriving correction factors for the measured data and applying the corrections factors to the measured data so as to provide corrected parameter data having increased accuracy.Type: GrantFiled: April 19, 2002Date of Patent: May 18, 2004Assignee: OnWafer Technologies, Inc.Inventors: Kameshwar Polla, Costas J. Spanos
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Patent number: 6691068Abstract: Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.Type: GrantFiled: August 22, 2000Date of Patent: February 10, 2004Assignee: OnWafer Technologies, Inc.Inventors: Mason L. Freed, Randall S. Mundt, Costas J. Spanos
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Patent number: 6671660Abstract: Described are methods and apparatus that can provide increased power use efficiency for some applications of wireless telecommunications devices. An aspect of the present invention includes an apparatus for wireless communication. The apparatus includes a wireless communication system powered with a limited capacity power source. The apparatus is capable of controlling the power applied to the communication system so as to increase the efficiency for using the power. Another aspect of the present invention is a method of controlling power use for wireless telecommunications with a limited capacity power source.Type: GrantFiled: April 19, 2002Date of Patent: December 30, 2003Assignee: OnWafer Technologies, Inc.Inventor: Mason L. Freed
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Patent number: 6542835Abstract: Information transfer is effected using a network of electrical signal conductors and sensors forming crosspoint connections. The sensors are capable of representing a measurement parameter as an electrical impedance. One embodiment of the present invention includes output electrical conductors, input electrical conductors, and sensors. Each of the sensors is connected with one of the output electrical conductors and one of the input electrical conductors so as to form an array of crosspoint connections. Application of electrical signals to the sensors and measurement of electrical signals from the sensors provide sufficient information to derive relative information from each sensor using algorithms based on equations for combining impedance. The embodiment may further include one or more reference elements connected with the output electrical conductors and with the input electrical conductors so as to form crosspoint connections.Type: GrantFiled: March 22, 2001Date of Patent: April 1, 2003Assignee: OnWafer Technologies, Inc.Inventor: Randall S. Mundt