Patents Assigned to Ophthonix
  • Patent number: 6836371
    Abstract: Optical elements are made using micro-jet printing methods to precisely control the type, position and amount of polymer deposited onto a substrate. In preferred embodiments, the proportions of two or more different polymer compositions are varied over the course of the deposition process to deposit adjoining polymer pixels in the form of a film on the substrate surface. The optical properties of each adjoining polymer pixel can be selected to provide a predetermined optical property, including a specific value of index of refraction. Preferably, the film has a radially non-monotonic refractive index profile and/or an angularly non-monotonic refractive index profile.
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: December 28, 2004
    Assignee: Ophthonix, Inc.
    Inventors: Shui T. Lai, Larry Sverdrup
  • Patent number: 6813082
    Abstract: The wavefront aberrator of the present invention includes a pair of transparent windows, or plates, separated by a layer of monomers and polymerization initiator, including a broad class of epoxies. This monomer exhibits a variable index of refraction across the layer, resulting from controlling the extent of its curing. Curing of the epoxy may be made by exposure to light, such as ultraviolet light. The exposure to light may be varied across the surface of the epoxy to create a particular and unique refractive index profile.
    Type: Grant
    Filed: June 4, 2001
    Date of Patent: November 2, 2004
    Assignee: Ophthonix, inc.
    Inventor: Donald G. Bruns
  • Patent number: 6781681
    Abstract: A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optics systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: August 24, 2004
    Assignee: Ophthonix, Inc.
    Inventor: Larry S. Horwitz
  • Patent number: 6761454
    Abstract: An apparatus for determining the objective refraction of a patient's eye includes a transparent window and a wavefront measurement device that determines aberrations in a return beam from the patient's eye after the beam passes through a corrective test lens in the apparatus. The wavefront measurement device outputs an instant display representative of the quality of vision afforded the patient through the test lens. The display can be a representation of a Snellen chart, convoluted with the optical characteristics of the patient's vision, an overall quality of vision scale or the optical contrast function, all based on the wavefront measurements of the patient's eye. The examiner may use the display information to conduct a refraction examination and other vision tests without the subjective response from the patient.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: July 13, 2004
    Assignee: Ophthonix, Inc.
    Inventors: Shui T. Lai, Andreas Dreher
  • Patent number: 6712466
    Abstract: An Eyeglass Manufacturing Method Using Epoxy Aberrator includes two lenses with a variable index material, such as epoxy, sandwiched in between. The epoxy is then cured to different indexes of refraction that provide precise corrections for the patient's wavefront aberrations. The present invention further provides a method to produce an eyeglass that corrects higher order aberrations, such as those that occur when retinal tissue is damaged due to glaucoma or macular degeneration. The manufacturing method allows for many different applications including, but not limited to, supervision and transition lenses.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: March 30, 2004
    Assignee: Ophthonix, Inc.
    Inventor: Andreas W. Dreher
  • Patent number: 6682195
    Abstract: A Custom Eyeglass Manufacturing Method includes a wavefront measuring device with a plurality of cameras directed at a patient's face. The resulting images are processed by a computer to determine the location of pupils, center of pupils, pupil distance, width of face, ear location, distance of corneal apex from the wavefront measuring device, distance from ear to corneal apex, and other desired parameters necessary to quantify a patient's face for custom eyeglass fittings. Moldings may be applied to patient's nose, temples, and ears in order to construct a pair of eyeglasses that fix perfectly on patient's head. Additionally, a test frame may be used in combination with the wavefront measuring device in order to allow computer to find some of the areas automatically. Lastly, registration markers may be applied to either the test frame, the moldings, or both in order to further aide the computer in locating desired parameters.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: January 27, 2004
    Assignee: Ophthonix, Inc.
    Inventor: Andreas W. Dreher