Patents Assigned to Optaglio Ltd.
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Patent number: 7435979Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.Type: GrantFiled: August 16, 2006Date of Patent: October 14, 2008Assignee: Optaglio Ltd.Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
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Publication number: 20080145765Abstract: A metal identification platelet equipped with an identification code, while the identification code comprises a hologram. A method of producing the identification platelet with the identification code, including the following steps: A shield from an electro-insulation material is formed on a shim with a holographic motif. Then, the shim is galvanized in the places not covered by the shield from the electro-insulation material. And the completed metal identification platelets are removed from the shim.Type: ApplicationFiled: December 2, 2004Publication date: June 19, 2008Applicant: Optaglio Ltd.Inventor: Igor Jermolajev
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Patent number: 7358513Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.Type: GrantFiled: July 16, 2002Date of Patent: April 15, 2008Assignee: Optaglio Ltd.Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
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Publication number: 20070284546Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimisation and allocation control and to optical devices such as those produced thereby.Type: ApplicationFiled: August 16, 2006Publication date: December 13, 2007Applicant: Optaglio Ltd.Inventors: Zbynek Ryzi, Kenneth Drinkwater, Frantisek Matejka
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Patent number: 7199911Abstract: An optical device for security and anti-counterfeit applications has a holographic diffractive structure that includes a discrete region that in response to white light illumination generates a holographic image by a process of diffraction of light in one embodiment combined with a paper substrate which also contains a secure mark produced by laser ablation of the structure, the mark being characterised by various attributes: variable cut width and pattern, being visible both in reflected light and also in transmitted light, variable depth of cut, variable perforation visible in transmission, variable reflection characteristics. In one embodiment when combined with paper based laser mark has elements in both metallised diffractive region and paper region, the marks on different regions showing different characteristics and thereby securely linking diffractive structure and paper substrate and also showing different characteristics of marking pattern on the different materials.Type: GrantFiled: July 2, 2001Date of Patent: April 3, 2007Assignee: Optaglio Ltd.Inventors: Philip Hudson, John Drinkwater