Patents Assigned to Optaglio Ltd.
  • Patent number: 7435979
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
    Type: Grant
    Filed: August 16, 2006
    Date of Patent: October 14, 2008
    Assignee: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
  • Publication number: 20080145765
    Abstract: A metal identification platelet equipped with an identification code, while the identification code comprises a hologram. A method of producing the identification platelet with the identification code, including the following steps: A shield from an electro-insulation material is formed on a shim with a holographic motif. Then, the shim is galvanized in the places not covered by the shield from the electro-insulation material. And the completed metal identification platelets are removed from the shim.
    Type: Application
    Filed: December 2, 2004
    Publication date: June 19, 2008
    Applicant: Optaglio Ltd.
    Inventor: Igor Jermolajev
  • Patent number: 7358513
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: April 15, 2008
    Assignee: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
  • Publication number: 20070284546
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimisation and allocation control and to optical devices such as those produced thereby.
    Type: Application
    Filed: August 16, 2006
    Publication date: December 13, 2007
    Applicant: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth Drinkwater, Frantisek Matejka
  • Patent number: 7199911
    Abstract: An optical device for security and anti-counterfeit applications has a holographic diffractive structure that includes a discrete region that in response to white light illumination generates a holographic image by a process of diffraction of light in one embodiment combined with a paper substrate which also contains a secure mark produced by laser ablation of the structure, the mark being characterised by various attributes: variable cut width and pattern, being visible both in reflected light and also in transmitted light, variable depth of cut, variable perforation visible in transmission, variable reflection characteristics. In one embodiment when combined with paper based laser mark has elements in both metallised diffractive region and paper region, the marks on different regions showing different characteristics and thereby securely linking diffractive structure and paper substrate and also showing different characteristics of marking pattern on the different materials.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: April 3, 2007
    Assignee: Optaglio Ltd.
    Inventors: Philip Hudson, John Drinkwater