Patents Assigned to OPTALYSYS LTD.
  • Patent number: 10409084
    Abstract: A method for assessing the relative alignment of a first and second diffractive element. The method includes illuminating the first diffractive element to form a first diffraction pattern in the far field and illuminating the second diffractive element to form a second diffraction pattern in the far field. The method further comprises determining a positional and/or rotational relationship between the first diffraction pattern and the second diffraction pattern in the far field.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: September 10, 2019
    Assignee: Optalysys Ltd.
    Inventors: Nicholas James New, Robert Todd
  • Patent number: 9594394
    Abstract: An optical processing system comprises an optical input; one or more spatial light modulator arrays; and a detector array; wherein at least of said spatial light modulator arrays incorporates a plurality of data elements focusing elements; said data elements and/or said focussing elements having multiple degrees of freedom.
    Type: Grant
    Filed: July 4, 2013
    Date of Patent: March 14, 2017
    Assignee: OPTALYSYS LTD.
    Inventor: Nicholas James New