Abstract: A method for assessing the relative alignment of a first and second diffractive element. The method includes illuminating the first diffractive element to form a first diffraction pattern in the far field and illuminating the second diffractive element to form a second diffraction pattern in the far field. The method further comprises determining a positional and/or rotational relationship between the first diffraction pattern and the second diffraction pattern in the far field.
Abstract: An optical processing system comprises an optical input; one or more spatial light modulator arrays; and a detector array; wherein at least of said spatial light modulator arrays incorporates a plurality of data elements focusing elements; said data elements and/or said focussing elements having multiple degrees of freedom.