Patents Assigned to Optimax Systems, Inc.
  • Apparatus and process for polishing a substrate
    Patent number: 6942554
    Abstract: An apparatus for polishing a substrate with an optical surface. The apparatus contains a polishing pad and and a device for oscillating the polishing pad while simultaneously contacting it with at least 90 percent of said optical surface.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: September 13, 2005
    Assignee: Optimax Systems, Inc.
    Inventor: Michael P. Mandina