Abstract: A device and a method are used for measuring the surface topography and a wave aberration of a lens system. The device is fitted with a first measuring system containing a light source radiating a first light beam of a first wavelength, and a detector which captures the first light beam which is reflected on the lens system. In addition the device has a second measuring system containing a light source for radiating a second light beam of a second wavelength and a detector for capturing the second light beam transmitted by the lens system. A diffractive optical element is disposed in a common beam path of the first measuring system and second measuring system. The optical element adapts the respective wave-front course of the first light beam and the second light beam in a wavelength-selective manner.