Patents Assigned to Optomec Design Company
  • Patent number: 8110247
    Abstract: A method of depositing various materials onto heat-sensitive targets, particularly oxygen-sensitive materials. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: February 7, 2012
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Publication number: 20110129615
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Application
    Filed: December 22, 2010
    Publication date: June 2, 2011
    Applicant: OPTOMEC, INC. FKA OPTOMEC DESIGN COMPANY
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7938341
    Abstract: A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: May 10, 2011
    Assignee: Optomec Design Company
    Inventors: Bruce H. King, Michael J. Renn, Jason A. Paulsen
  • Patent number: 7938079
    Abstract: Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: May 10, 2011
    Assignee: Optomec Design Company
    Inventors: Bruce H. King, Michael J. Renn, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7674671
    Abstract: Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: March 9, 2010
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Marcelino Essien, Bruce H. King, Jason A. Paulsen
  • Patent number: 7658163
    Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
    Type: Grant
    Filed: July 20, 2006
    Date of Patent: February 9, 2010
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Publication number: 20090114151
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Application
    Filed: January 6, 2009
    Publication date: May 7, 2009
    Applicant: OPTOMEC, INC. FKA OPTOMEC DESIGN COMPANY
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7485345
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: February 3, 2009
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7294366
    Abstract: A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like.
    Type: Grant
    Filed: September 27, 2004
    Date of Patent: November 13, 2007
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7270844
    Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: September 18, 2007
    Assignee: Optomec Design Company
    Inventor: Michael J. Renn
  • Publication number: 20070181060
    Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
    Type: Application
    Filed: July 20, 2006
    Publication date: August 9, 2007
    Applicant: Optomec Design Company
    Inventors: Michael Renn, Bruce King, Manampathy Giridharan, Jyh-Cherng Sheu
  • Publication number: 20070154634
    Abstract: Method and apparatus for low temperature sintering of sintering of printable conductive inks, preferably using a plasma. The inks can be deposited on a substrate using any number of deposition techniques, and can be applied to processing on materials including, but not limited to, electronic, biologic, and low-temperature substrates. The inks preferably comprise metallic nanoparticles coated with an organic non-conductive material. The plasma removes the organic material and facilitates the sintering of the metallic particles into a continuous deposit, without exposing the substrate to high temperatures.
    Type: Application
    Filed: December 14, 2006
    Publication date: July 5, 2007
    Applicant: OPTOMEC DESIGN COMPANY
    Inventor: Michael Renn
  • Publication number: 20070019028
    Abstract: A method of depositing various materials onto heat-sensitive targets, particularly oxygen-sensitive materials. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like.
    Type: Application
    Filed: May 8, 2006
    Publication date: January 25, 2007
    Applicant: Optomec Design Company
    Inventors: Michael Renn, Bruce King, Marcelino Essien, Manampathy Giridharan, Jyh-Cherng Sheu
  • Publication number: 20060280866
    Abstract: Methods and apparatus for the direct deposition or patterning of biological materials and compatible biomaterials. The method is capable of depositing biological materials and biomaterials in a computer defined pattern, and uses aerodynamic focusing of an aerosol stream to deposit mesoscale patterns onto planar or non-planar targets without the use of masks or modified environments. The aerosolized compositions may be processed before deposition (pre-processing) or after deposition on the target (post-processing). Depositable materials include, not are not limited to conductive metal precursors, nanoparticle metal inks, dielectric and resistor pastes, biocompatible polymers, and a range of biomolecules including peptides, viruses, proteinaceous enzymes, extra-cellular matrix biomolecules, as well as whole bacterial, yeast, and mammalian cell suspensions. The targets may be planar or non-planar, and are optionally biocompatible.
    Type: Application
    Filed: October 13, 2005
    Publication date: December 14, 2006
    Applicant: Optomec Design Company
    Inventors: Gregory Marquez, Michael Renn
  • Publication number: 20060233953
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Application
    Filed: December 22, 2005
    Publication date: October 19, 2006
    Applicant: Optomec Design Company
    Inventors: Michael Renn, Bruce King, Marcelino Essien, Gregory Marquez, Manampathy Giridharan, Jyh-Cherng Sheu
  • Patent number: 7108894
    Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: September 19, 2006
    Assignee: Optomec Design Company
    Inventor: Michael J. Renn
  • Publication number: 20060175431
    Abstract: A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
    Type: Application
    Filed: December 12, 2005
    Publication date: August 10, 2006
    Applicant: Optomec Design Company
    Inventors: Michael Renn, Bruce King, Jason Paulsen
  • Publication number: 20060163570
    Abstract: Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
    Type: Application
    Filed: December 12, 2005
    Publication date: July 27, 2006
    Applicant: Optomec Design Company
    Inventors: Michael Renn, Marcelino Essien, Bruce King, Jason Paulsen
  • Patent number: 7045015
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: May 16, 2006
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Lemna J. Hunter
  • Publication number: 20060008590
    Abstract: Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.
    Type: Application
    Filed: December 13, 2004
    Publication date: January 12, 2006
    Applicant: Optomec Design Company
    Inventors: Bruce King, Michael Renn, Marcelino Essien, Gregory Marquez, Manampathy Giridharan, Jyh-Cherng Sheu