Patents Assigned to Optomecha Co., Ltd.
  • Patent number: 8300328
    Abstract: A lens unit composed of different materials includes a base and a lens. A part of a camera module of a different material from the lens is used as the base. The lens of optical resin is directly replicated on the base such that the lens is integrally formed on the base. A camera module is provided with the lens unit. The lens/lenses is/are formed on the single base/multiple bases to form the lens unit/units, using a die whose surface contacting the base slopes in relation to its central axis to allow the base to self-align.
    Type: Grant
    Filed: July 3, 2008
    Date of Patent: October 30, 2012
    Assignee: Optomecha Co., Ltd.
    Inventors: Shinill Kang, Ji Seok Lim, Min Seok Choi
  • Publication number: 20110085070
    Abstract: A lens unit composed of different materials includes a base and a lens. A part of a camera module of a different material from the lens is used as the base. The lens of optical resin is directly replicated on the base such that the lens is integrally formed on the base. A camera module is provided with the lens unit. The lens/lenses is/are formed on the single base/multiple bases to form the lens unit/units, using a die whose surface contacting the base slopes in relation to its central axis to allow the base to self-align.
    Type: Application
    Filed: July 3, 2008
    Publication date: April 14, 2011
    Applicant: OPTOMECHA CO. LTD.
    Inventors: Shinill Kang, Ji Seok Lim, Min Seok Choi
  • Patent number: 7253394
    Abstract: An image sensor includes a substrate in which photoelectric elements have been formed, and an array of optical path conversion elements formed at a light so that the optical path converted light may be incident on the substrate, wherein each of the optical path conversion elements has different tangent line gradients on the corresponding parts of incident surfaces according to distances from the center of the image sensor in order to compensate for differences of incident angles of incident light according to the distances from the center of the image sensor. In addition, a method for fabricating the image sensor fabricates the optical path conversion elements according to a photolithography process using a gray scale mask, combinations of the photolithography process and a reactive ion etching process, or combinations of the photolithography process, the reactive ion etching process, and an UV-molding process.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: August 7, 2007
    Assignees: Optomecha Co., Ltd.
    Inventor: Shinill Kang
  • Publication number: 20070053037
    Abstract: An image sensor includes a substrate in which photoelectric elements have been formed, and an array of optical path conversion elements formed at a light so that the optical path converted light may be incident on the substrate, wherein each of the optical path conversion elements has different tangent line gradients on the corresponding parts of incident surfaces according to distances from the center of the image sensor in order to compensate for differences of incident angles of incident light according to the distances from the center of the image sensor. In addition, a method for fabricating the image sensor fabricates the optical path conversion elements according to a photolithography process using a gray scale mask, combinations of the photolithography process and a reactive ion etching process, or combinations of the photolithography process, the reactive ion etching process, and an UV-molding process.
    Type: Application
    Filed: March 30, 2004
    Publication date: March 8, 2007
    Applicant: OPTOMECHA CO. LTD.
    Inventor: Shinill Kang