Patents Assigned to OPTROMAX ELECTRONICS CO., LTD
  • Patent number: 9307592
    Abstract: A constant current driving device includes an electronic device, a transistor, a rectifying circuit, a current limiting element, an impedance element, and a first and a second energy storage element. A first end of the electronic device is connected to a first end of a load element. A first end of the transistor is connected to a second end of the load element, a second end of the transistor is connected to a second end of the electronic device through an impedance element, and a control end of the transistor is connected to the second end of the electronic device through a first energy storage element. The rectifying circuit connected between the first end and the control end of the transistor. The current limiting element is connected in parallel with the rectifying circuit. The second energy storage element is connected between the first and second end of the electronic device.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: April 5, 2016
    Assignee: Optromax Electronics Co., LTD
    Inventor: Kuo-Tso Chen
  • Publication number: 20150373797
    Abstract: A constant current driving device includes an electronic device, a transistor, a rectifying circuit, a current limiting element, an impedance element, and a first and a second energy storage element. A first end of the electronic device is connected to a first end of a load element. A first end of the transistor is connected to a second end of the load element, a second end of the transistor is connected to a second end of the electronic device through an impedance element, and a control end of the transistor is connected to the second end of the electronic device through a first energy storage element. The rectifying circuit connected between the first end and the control end of the transistor. The current limiting element is connected in parallel with the rectifying circuit. The second energy storage element is connected between the first and second end of the electronic device.
    Type: Application
    Filed: December 11, 2014
    Publication date: December 24, 2015
    Applicant: Optromax Electronics Co., LTD
    Inventor: Kuo-Tso Chen
  • Patent number: 8947004
    Abstract: An electronic device is provided. The electronic device includes a plurality of load units, a plurality of serial-parallel switch units and a control module. The control module switches the serial-parallel switch units to a first state or a second state according to a level variation of an input voltage. Connection relations of the load units are correspondingly changed according to the level variation of the input voltage. In this way, the electronic device can be driven by an alternating-current voltage.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: February 3, 2015
    Assignee: Optromax Electronics Co., Ltd
    Inventor: Kuo-Tso Chen
  • Patent number: 8692266
    Abstract: A circuit substrate structure including a substrate, a dielectric stack layer, a first plating layer and a second plating layer is provided. The substrate has a pad. The dielectric stack layer is disposed on the substrate and has an opening exposing the pad, wherein the dielectric stack layer includes a first dielectric layer, a second dielectric layer and a third dielectric layer located between the first dielectric layer and the second dielectric layer, and there is a gap between the portion of the first dielectric layer surrounding the opening and the portion of the second dielectric layer surrounding the opening. The first plating layer is disposed at the dielectric stack layer. The second plating layer is disposed at the pad, wherein the gap isolates the first plating layer from the second plating layer.
    Type: Grant
    Filed: April 2, 2013
    Date of Patent: April 8, 2014
    Assignee: Optromax Electronics Co., Ltd
    Inventor: Kuo-Tso Chen
  • Publication number: 20130214422
    Abstract: A circuit substrate structure including a substrate, a dielectric stack layer, a first plating layer and a second plating layer is provided. The substrate has a pad. The dielectric stack layer is disposed on the substrate and has an opening exposing the pad, wherein the dielectric stack layer includes a first dielectric layer, a second dielectric layer and a third dielectric layer located between the first dielectric layer and the second dielectric layer, and there is a gap between the portion of the first dielectric layer surrounding the opening and the portion of the second dielectric layer surrounding the opening. The first plating layer is disposed at the dielectric stack layer. The second plating layer is disposed at the pad, wherein the gap isolates the first plating layer from the second plating layer.
    Type: Application
    Filed: April 2, 2013
    Publication date: August 22, 2013
    Applicant: OPTROMAX ELECTRONICS CO., LTD
    Inventor: Kuo-Tso Chen
  • Patent number: 8431454
    Abstract: A fabricating process of circuit substrate sequently includes: providing a substrate with a pad and a dielectric stack layer disposed at the substrate and overlaying the pad, in which the stack layer includes two dielectric layers and a third dielectric layer located between the two dielectric layers, and the etching rate of the third dielectric layer is greater than the etching rate of the two dielectric layers; forming an opening corresponding to the pad at the stack layer; performing a wet etching process on the stack layer to remove the portion of the third dielectric layer surrounding the opening to form a gap between the portions of the two dielectric layers surrounding the opening; performing a plating process on the stack layer and the pad to respectively form two plating layers at the stack layer and the pad, in which the gap isolates the two plating layers from each other.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: April 30, 2013
    Assignee: Optromax Electronics Co., Ltd
    Inventor: Kuo-Tso Chen
  • Publication number: 20120025346
    Abstract: A fabricating process of circuit substrate sequently includes: providing a substrate with a pad and a dielectric stack layer disposed at the substrate and overlaying the pad, in which the stack layer includes two dielectric layers and a third dielectric layer located between the two dielectric layers, and the etching rate of the third dielectric layer is greater than the etching rate of the two dielectric layers; forming an opening corresponding to the pad at the stack layer; performing a wet etching process on the stack layer to remove the portion of the third dielectric layer surrounding the opening to form a gap between the portions of the two dielectric layers surrounding the opening; performing a plating process on the stack layer and the pad to respectively form two plating layers at the stack layer and the pad, in which the gap isolates the two plating layers from each other.
    Type: Application
    Filed: July 26, 2011
    Publication date: February 2, 2012
    Applicant: OPTROMAX ELECTRONICS CO., LTD
    Inventor: Kuo-Tso Chen
  • Publication number: 20110080101
    Abstract: An electronic device is provided. The electronic device includes a plurality of load units, a plurality of serial-parallel switch units and a control module. The control module switches the serial-parallel switch units to a first state or a second state according to a level variation of an input voltage. Connection relations of the load units are correspondingly changed according to the level variation of the input voltage. In this way, the electronic device can be driven by an alternating-current voltage.
    Type: Application
    Filed: October 1, 2010
    Publication date: April 7, 2011
    Applicant: OPTROMAX ELECTRONICS CO., LTD
    Inventor: Kuo-Tso Chen