Abstract: An alignment mechanism (A) for light exposure for use in a light exposure apparatus (1) having a transferring mechanism (2), which transfers a work; a light exposure table (3) which supports the work (W) and actuates in the vertical direction; an upper frame (9) placed on an upper side of the light exposure table, which supports a mask (M); and a vacuum absorption mechanism for bringing the work into contact with the mask when the light exposure table ascends is provided. The alignment mechanism has a pre-alignment mechanism (C) for pre-aligning the work on the light exposure table, and a mask alignment mechanism (D) for aligning the position of the mask to the position of the work.

Abstract: An improved alignment table employable for an automatic exposing apparatus used for producing a number of printed wiring boards, wherein the alignment table is designed in a flat and hollow box-shaped configuration comprising an upper plate, a lower plate and side plates, the upper plate and the lower plate are provided with transparent plates at positions located opposite to each other, respectively, and the upper surface of the transparent plate placed on the upper plate is provided in the form of a mat surface.