Abstract: An encapsulated high brightness source for use in or with an electron beam system such as an electron beam microscope. The source preferably includes a field emitter. The source includes source enclosure means which defines an ultra high vacuum enclosure for the field emitter. A lens which serves as part of the ultra high vacuum enclosure for the source defines a differential pressure aperture. Other lens elements draw electrons from the field emitter and form a focus on axis in the vicinity of the differential pressure aperture, which serves as an effective point source for the associated electron beam system. The source may be permanently built-in or modular; if modular, it may be assembled, tested, and stored in an ultra high vacuum operative condition for OEM assembly or as a replacement part.