Patents Assigned to OrelTech Ltd.
  • Composition for forming a patterned metal film on a substrate
    Patent number: 12331210
    Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
    Type: Grant
    Filed: April 18, 2023
    Date of Patent: June 17, 2025
    Assignee: OrelTech Ltd.
    Inventor: Natalia Zamoshchik
  • Method and system for forming a patterned metal film on a substrate
    Patent number: 11912883
    Abstract: A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: February 27, 2024
    Assignee: ORELTECH LTD.
    Inventor: Natalia Zamoshchik
  • Method for metal layer formation
    Patent number: 11746421
    Abstract: A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: September 5, 2023
    Assignee: ORELTECH LTD.
    Inventors: Natalia Zamoshchik, Konstantin Livanov, Yana Sheynin
  • COMPOSITION FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE
    Publication number: 20230257613
    Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
    Type: Application
    Filed: April 18, 2023
    Publication date: August 17, 2023
    Applicant: OrelTech Ltd.
    Inventor: Natalia ZAMOSHCHIK
  • Composition for forming a patterned metal film on a substrate
    Patent number: 11661527
    Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
    Type: Grant
    Filed: April 19, 2017
    Date of Patent: May 30, 2023
    Assignee: ORELTECH LTD.
    Inventor: Natalia Zamoshchik
  • TRANSPARENT CONDUCTIVE METAL LAYERS
    Publication number: 20210309868
    Abstract: A method for growing a transparent conductive metal layer on a substrate is disclosed. The method includes the steps of applying crystal growth ink to a surface of the substrate, wherein the crystal growth ink includes a metal ionic precursor; and exposing the substrate to plasma irradiation to cause the growing of a crystalline metal framework on the substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Application
    Filed: June 7, 2021
    Publication date: October 7, 2021
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV
  • METHOD FOR METAL LAYER FORMATION
    Publication number: 20200017974
    Abstract: A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Application
    Filed: July 23, 2019
    Publication date: January 16, 2020
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV, Yana SHEYNIN
  • METAL ACTIVE COMPONENT FORMATION IN HYBRID MATERIALS
    Publication number: 20190211455
    Abstract: A method for forming a metal active component in a hybrid material is provided. The method includes applying a metal precursor formulation on a substrate; and exposing the metal precursor formulation applied on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a set of exposure parameters.
    Type: Application
    Filed: March 11, 2019
    Publication date: July 11, 2019
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV, Leonid KOZLOV, Yana SHEYNIN
  • COMPOSITION FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE
    Publication number: 20170218218
    Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
    Type: Application
    Filed: April 19, 2017
    Publication date: August 3, 2017
    Applicant: OrelTech Ltd.
    Inventor: Natalia ZAMOSHCHIK
  • METHOD AND SYSTEM FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE
    Publication number: 20160258048
    Abstract: A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
    Type: Application
    Filed: April 21, 2016
    Publication date: September 8, 2016
    Applicant: OrelTech Ltd.
    Inventor: Natalia ZAMOSHCHIK