Abstract: The present invention discloses means, use and non-GM method for modulating proteins in microorganisms. This method comprising steps of providing a system comprising a plasma discharge source, the plasma; the plasma discharge electric field is in the range of about 200 to about 500 v/m; and a plasma modifying mechanism comprising (1) at least one magnetic material, and at least one piezoelectric material, and (2) at least one optical crystal material, the plasma modifying mechanism providing modified plasma output having frequencies in the range of about 3 KHz to about 30 KHz; and discharging the plasma towards the microorganisms in a pulsed profile; thereby modulating proteins from the target microorganisms. The invention also discloses means, use and non-GM method for de novo generating of proteins in microorganisms from within the proteome of the microorganisms.
Abstract: The present invention discloses a method for providing at least one biological effect in at least one microorganism. The aforementioned method comprises steps of: (a) providing a system for administering modified plasma; (b) providing a substrate hosting said at least one microorganism; and (c) administering the generated modified plasma beam in a predetermined pulsed manner to said substrate hosting said at least one microorganism to provide said at least one biological effect to said at least one microorganism. The present invention further provides a system thereof.
Abstract: The present invention discloses a method for providing at least one biological effect in at least one microorganism. The aforementioned method comprises steps of: (a) providing a system for administering modified plasma; (b) providing a substrate hosting said at least one microorganism; and (c) administering the generated modified plasma beam in a predetermined pulsed manner to said substrate hosting said at least one microorganism to provide said at least one biological effect to said at least one microorganism. The present invention further provides a system thereof.
Abstract: The present invention discloses a system for the administration of a plasma modified field (PMF) to a subject comprising: (a) a non thermal plasma (NTP) emitting source for emitting a plasma beam; (b) a plasma modified field coupling mechanism (PMFCM) comprising a plasma beam dish having at least one opening for the passage of said plasma beam; said plasma beam dish having a first surface and a second opposite surface; and (c) a controller for controlling said PMFCM. In a main aspect of the invention, said first surface of said plasma beam dish is mounted with: (i) at least one coupling element selected from the group consisting of: (1) at least one ferroelectric element for providing said field; (2) at least one ferromagnetic element for providing said field; (3) at least one piezoelectric element for providing said field; and (4) at least one piezomagnetic element for providing said field; and (ii) at least one reflecting element.
Abstract: The present invention discloses a system for the administration of a plasma modified field (PMF) to a subject comprising: (a) a non thermal plasma (NTP) emitting source for emitting a plasma beam; (b) a plasma modified field coupling mechanism (PMFCM) comprising a plasma beam dish having at least one opening for the passage of said plasma beam; said plasma beam dish having a first surface and a second opposite surface; and (c) a controller for controlling said PMFCM. In a main aspect of the invention, said first surface of said plasma beam dish is mounted with: (i) at least one coupling element selected from the group consisting of: (1) at least one ferroelectric element for providing said field; (2) at least one ferromagnetic element for providing said field; (3) at least one piezoelectric element for providing said field; and (4) at least one piezomagnetic element for providing said field; and (ii) at least one reflecting element.