Abstract: A variable light apodizer for apodizing a light beam is provided and includes at least one side filter disposed across a path of the light beam. Each side filter has a light transmission profile along an axis transverse to the propagation axis which is maximum from a first edge of the light beam up to a transition point within the light beam and gradually decreases from the transition point to a second edge of said light beam. The variable light apodizer further includes a filter-moving assembly having at least one mechanical mount one which are secured the side filters. Each mechanical mount is movable according to a motion shifting the light transmission profile of the side filter or filters thereon along the corresponding transverse axis. This motion provides a variable apodization of an edge portion of the light beam along the corresponding transverse axis.

Abstract: An optical beam shaping device for transforming the spatial profile of a light beam into a top hat profile is provided. The optical beam shaping device includes two main components, both provided across the path of the light beam, in any order: an electrical field corrector and a top hat field mapper. The electrical field corrector is configured to alter the electrical field of the light beam along a transverse axis to convert the initial profile of the light beam into a predetermined mapper-input profile. The top hat field mapper is configured to convert light distribution along the transverse axis from the predetermined mapper-input profile to the top hat profile. In some implementations, the initial profile of the light beam is corrected from its original, non-TEM00 shape to a shape better suited to yield a quality top hat profile through the top hat field mapper.

Abstract: A light sheet generating assembly is provided, for generating a light sheet having an extended depth of field (EDOF) over an EDOF range from a light beam. The light beam has a propagation axis and a light intensity distribution transverse to the propagation axis. The light sheet generating assembly includes a depth of field extender configured to alter an electrical field of the light beam to redistribute the light intensity of the light beam along a first transverse axis orthogonal to the propagation axis according to (1) an inner intensity peak, and (2) outer intensity features having an intensity below an outer intensity threshold over said EDOF range. The light sheet generating assembly further includes a line generator configured to redistribute the light intensity of the light beam along a second transverse axis orthogonal to the first transverse axis and to the propagation axis into a line.

Abstract: A laser line generating assembly for projecting a low-speckle laser line is provided. The laser line generating includes a laser source, a beam divider and a sub-beam converter. The laser source generating a laser beam having a temporal coherence. The beam divider divides the laser beam into incoherent multiple sub-beams propagating in a same propagation plane. The sub-beam converter generates a plurality of laser light sheets, each laser light sheet being associated with a corresponding one of the sub-beams. Each laser light sheet extends within the propagation plane. The laser light sheets intersect a projection plane to define laser line elements overlapping at least partially to form said low-speckle laser line, the laser line elements having respective speckle patterns which are at least partially uncorrelated.

Abstract: In one embodiment, the optical device for generating an illumination pattern has a beam splitter and a pattern generator mounted in series and optically coupled one with the other. The beam splitter and the pattern generator are configured to cooperate one with the other in formatting an incident light beam into the illumination pattern. The illumination pattern has a plurality of diffraction patterns each resulting from a corresponding portion of the incident light beam being split from other portions of the incident light beam by the beam splitter. Each diffraction pattern has a zero-order beam. Each diffraction pattern overlaps with at least one of the other diffraction patterns and forms at least one overlapping region therewith, wherein the plurality of zero-order beams of the plurality of diffraction patterns are separated from one another in the illumination pattern.