Abstract: An apparatus and method for exposing a film of radiation sensitive material overlying a substrate to a pattern of radiation utilizes proximity focusing of a mask pattern onto the film and step and repeat techniques for exposing the entire area of the film to be exposed. The apparatus includes a source of radiation, a substrate holder supporting the substrate with the film of radiation sensitive material thereon in the path of the radiation, and a mask holder for supporting the mask intermediate the radiation source and the film in close proximity thereto for proximity focusing the mask pattern onto the film. A stepping means incrementally moves the mask relative to the substrate to permit exposure of the film area.

Abstract: Light influencing displays and more particularly liquid crystal displays are disclosed which have a pair of light transmissive electrode supports which are uniformly spaced apart by a predetermined distance over the entire display area. The electrode supports are spaced apart by spacer means including a plurality of spacers arranged in a predetermined pattern between the electrode supports.