Patents Assigned to Oxyphen GmbH
  • Patent number: 5234538
    Abstract: Polymer filter film for which pores are etched along beam tracks only in a first, porous region (P1), and which has a second, impermeable region (R1), in particular in the form of a peripheral region. The peripheral region (R1) is made etch-resistant by a heat treatment of the beam tracks. Advantageous embodiments of the method are used to produce microchambers in the film for holding a cell culture. They can advantageously be used for enzymatic sensors and microbiological reactors.
    Type: Grant
    Filed: February 7, 1992
    Date of Patent: August 10, 1993
    Assignee: Oxyphen GmbH
    Inventor: Hans B. Luck