Abstract: A cultivation system moves containers between a growing area and a monitoring area. The containers hold cultivation beds for cultivating plants, and the cultivation system includes: a grow light emitting unit emitting grow light for growing the cultivated plants in the containers located in the growing area; an imaging unit capturing the cultivated plants in the containers located in the monitoring area; and a control unit causing the grow light emitting unit to stop emitting the grow light when the imaging unit captures the plants.

Abstract: An optical glass composition contains, in % by weight, 1.0% or more and 12.0% or less of SiO2, 8.0% or more and 18.0% or less of B2O3, 0% or more and 6.0% or less of ZnO, 1.0% or more and 10.0% or less of ZrO2, 25.0% or more and 47.0% or less of La2O3, 0% or more and 5.0% or less of R2O (here, R is at least one of Li, Na and K), 0% or more and 15.0% or less of Nb2O5, 0% or more and 7.0% or less of TiO2, 0% or more and 15.0% or less of Ta2O5, 1.0% or more of Nb2O5+TiO2+Ta2O5, 0% or more and 25.5% or less of Gd2O3, 0.5% or more and 15.0% or less of WO3 and 0.5% or more and 26.0% or less of Gd2O3+WO3, and has nd of 1.88 or higher and 1.92 or lower and ?d of 33 or higher and 37 or lower, and a preform and an optical element are formed from the optical glass composition.

Abstract: Disclosed is a plasma processing device that provides an object to be treated with plasma treatment. A wafer as an object to be treated, which is attached on the upper surface of adhesive sheet held by a holder frame, is mounted on a stage. In a vacuum chamber that covers the stage therein, plasma is generated, by which the wafer mounted on the stage undergoes plasma treatment. The plasma processing device contains a cover member made of dielectric material. During the plasma treatment on the wafer, the holder frame is covered with a cover member placed at a predetermined position above the stage, at the same time, the wafer is exposed from an opening formed in the center of the cover member.

Abstract: A multilayer flow path member of an ultrasonic fluid measurement apparatus and an ultrasonic fluid measurement apparatus capable of enhancing the measurement accuracy of the mean flow velocity are provided. When a multilayer flow path member 30 placed in a measurement flow path 14a shaped in a rectangular cross-section pipe of an ultrasonic fluid measurement apparatus 10 is partitioned into a plurality of flat flow paths 14e by partition plates 32 attached to a frame 31 along a flowing direction, the partition plates 32 are provided so as to face inner faces 15f and 17a of the measurement flow path 14a. Thus, the partition plates 32 are exposed and face the inner faces 15f and 17a of the measurement flow path 14a and thus the space between the exposed partition plate 32 and the inner face 15f, 17a of the measurement flow path 14a becomes the highest-stage or lowest-stage flat flow path 14e.