Abstract: A cleaning agent, a composition including the agent, and methods of forming and using the agent and composition are disclosed. The agent is formed by combining an organic acid and an amine in the presence in a base to form a compound for chelating copper ions. The composition optionally includes diluents, surfactants, sequestering agents, corrosion inhibitors and/or thickening agents.
Abstract: A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.
Abstract: A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.