Abstract: A method and fabric structure that employs a napped fabric to protect a subject from an arc flash. At least one napped fabric layer with an increase in fabric thickness due to napping of at least 35% is incorporated into a normal arc protective fabric structure to increase EBT by at least 8%.
Type:
Grant
Filed:
May 17, 2004
Date of Patent:
February 27, 2007
Assignee:
Paramount Corp.
Inventors:
Jack B. Hirschmann, Jr., Thomas E. Neal