Patents Assigned to Pars, Inc.
  • Patent number: 5982100
    Abstract: A plasma reactor incorporating the invention includes a plasma chamber and one or more gas inlets for introducing an ionizable gas into the plasma chamber. A dielectric plate is positioned over an opening to the plasma chamber and above a support that holds a workpiece. An inductor is juxtapositioned to the dielectric plate and comprises multiple winding portions which evidence plural segments of increasing radii from a center of the inductor. Segments of lesser radii are arranged to reside further away from the dielectric plate than segments of greater radii, lending the inductor a truncated conical shape with respect to the dielectric plate. By modifying the pitch angle and/or radius of the plural segments, the field configuration within the chamber can be varied to accommodate different workpieces.
    Type: Grant
    Filed: March 12, 1998
    Date of Patent: November 9, 1999
    Assignee: Pars, Inc.
    Inventor: Ebrahim Ghanbari